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Raster and light valve array processed by electric microcomputer for laser filmsetting and its production

A technology of grating light valve and processing method, which is applied in the direction of diffraction grating, optical mechanical equipment, phototypesetting device, etc., can solve the problems of slow scanning speed and low scanning precision of laser phototypesetting system, achieve volume reduction, high imaging precision, The effect of fast response speed

Inactive Publication Date: 2007-11-21
ZHEJIANG UNIV
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

[0004] In order to solve the problems of slow scanning speed and low scanning precision in the laser phototypesetting system, the present invention proposes a micro-electromechanical processing grating light valve array and its method for laser phototypesetting

Method used

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  • Raster and light valve array processed by electric microcomputer for laser filmsetting and its production
  • Raster and light valve array processed by electric microcomputer for laser filmsetting and its production
  • Raster and light valve array processed by electric microcomputer for laser filmsetting and its production

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Embodiment

[0066] 1) A silicon dioxide layer and a silicon sacrificial layer are grown on the silicon substrate, and a layer of silicon nitride, monocrystalline silicon or polycrystalline silicon is grown on the surface of the silicon sacrificial layer. The thickness of the silicon substrate is 300 microns and the thickness of the silicon dioxide layer is 0.7 Micron, the thickness of the silicon sacrificial layer is 1 micron, and the thickness of silicon nitride, single crystal silicon or polycrystalline silicon is 170 nanometers;

[0067] 2) A layer of photoresist is thrown on the surface of silicon nitride, monocrystalline silicon or polycrystalline silicon with a glue dispenser. Under the exposure machine, the mask plate with the pattern engraved is placed on the photoresist layer for exposure treatment. ;

[0068] 3) After the exposure treatment, a developing operation is performed in a dark room, the photoresist of the exposed part is removed, and the remaining photoresist is used a...

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Abstract

The invention is concerned with a raster light valve array with micro electromechanical systems for laser typesetter and its method. The array relates to silicon floor and there is silicon dioxide layer on the silicon floor. There are parallel fixed raster bar with equal alternation and movable raster bar on the silicon dioxide layer. The movable raster bar is the bridge shape with impending midst and the two ends of it fixes on the silicon dioxide layer. Develop a layer of silicon dioxide and sacrificial layer of silicon on the silicon floor, and develop silicon nitride, single crystal silicon or multi-crystalline silicon as cantilever beam on the sacrificial layer, and etch silicon nitride, single crystal silicon or multi-crystalline silicon with ion etching technology, using chemical corrosion to draw out the sacrificial layer, and at last, evaporate aluminum, platinum or silver as reflect surface and upper electrode. It applies into the laser typesetter system as laser scan control component. The component realizes multi-way scan of the system to increase the speed of laser typesetter greatly.

Description

technical field [0001] The invention relates to a micro-electromechanical processing grating light valve array and a method thereof for laser imagesetter. Background technique [0002] Laser imagesetter and laser plate-making machine are important equipment used in the printing industry. At present, most domestic imagesetters adopt the first-generation technology, that is, acousto-optic modulator scanning technology. Due to the limitation of the frequency response bandwidth of the modulator, scanning The number of channels is limited; at the same time, the printing industry is currently transitioning from laser imagesetters to plate-making machines. The laser light intensity scanned in the plate-making machine is relatively high, and the use of acousto-optic modulator technology cannot meet the requirements of direct plate-making, that is, light energy. At the same time, due to the limitation of the response bandwidth of the acousto-optic modulator, the imagesetter designed ...

Claims

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Application Information

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IPC IPC(8): B41B21/08G02B26/10G02B5/18G03F7/00
Inventor 张巍侯昌伦杨国光
Owner ZHEJIANG UNIV
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