Preparation method of UV-barrier copper-clad plate
A technology of copper cladding and processing method is applied in the field of preparation of UV blocking copper clad laminates, which can solve the problem that high-performance new copper clad laminates cannot meet market demands, and achieve the effects of low production cost, good UV blocking function and high production efficiency.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment approach
[0017] (4) Specific embodiments: the following examples can make those skilled in the art understand the present invention more comprehensively, but do not limit the present invention in any way.
Embodiment
[0019] Preparation method of UV blocking copper clad laminate:
[0020] (1) Electronic grade glass fiber cloth (substrate material) can be selected arbitrarily:
[0021] Type 7628 Thickness 0.2mm
[0022] Type 2116 Thickness 0.1mm
[0023] 1080 type thickness 0.045mm
[0024] (2) Glue formula: 1935 grams of brominated epoxy resin, 63 grams of four-functional resin, 102 grams of silica powder, 92 grams of 2MI (dimethylimidazole), 456 grams of DMF (dimethylformamide), DCD (double cyanamide) 45.6 grams, acetone 100 grams;
[0025] (3) Glue adjustment: Brominated epoxy resin, 2MI, DMF, silicon micropowder, DCD, acetone are mixed according to the above weight ratio, continuously and uniformly stirred in the glue tank, after aging for 6-8 hours, add four-functional resin and Continue to stir evenly for 2 to 4 hours;
[0026] (4) Gluing: After the electronic grade glass fiber cloth is soaked in the glue solution, it is dried in an oven at 180-200 °C, and the dried film (PP sheet...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com