Alkali developable paste composition
An alkali developing type and composition technology, which is applied in the direction of photography, photo-engraving process of pattern surface, photosensitive material used in opto-mechanical equipment, etc. Curability, improved manufacturing efficiency, and high reliability
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[0122] Hereinafter, the present invention will be specifically described by showing examples and comparative examples, but of course the present invention is not limited to the following examples.
Synthetic example 1
[0123] Synthesis Example 1: Synthesis of Carboxyl-containing Resin
[0124] In a flask equipped with a thermometer, a stirrer, a dropping funnel, and a reflux condenser, add methyl methacrylate and methacrylic acid in a molar ratio of 0.87:0.13, add dipropylene glycol monomethyl ether as a solvent, and dipropylene glycol monomethyl ether as a catalyst. Azodiisobutyronitrile was stirred at 80° C. for 6 hours under a nitrogen atmosphere to obtain a carboxyl-containing resin solution. The resin had a weight average molecular weight of about 10,000 and an acid value of 74 mgKOH / g. In addition, the weight-average molecular weight of the obtained copolymer resin was measured by connecting the pump LC-6AD manufactured by Shimadzu Corporation and the columns Shodex (registered trademark) KF-804 and KF-803 manufactured by Showa Denko Co., Ltd. , KF-802 three-column high performance liquid chromatography. Hereinafter, this carboxyl group-containing resin solution is referred to as A...
Synthetic example 2
[0125] Synthesis Example 2: Synthesis of Carboxyl-containing Photosensitive Resin
[0126] In the flask equipped with thermometer, stirrer, dropping funnel and reflux condenser, the feeding ratio of methyl methacrylate and methacrylic acid is 0.76:0.24 in molar ratio, add dipropylene glycol monomethyl ether as solvent, Azobisisobutyronitrile as a catalyst was stirred at 80° C. for 6 hours under a nitrogen atmosphere to obtain a carboxyl group-containing resin solution. Cool the carboxyl-containing resin solution, use methyl hydroquinone as a polymerization inhibitor, tetrabutylphosphonium bromide as a catalyst, and react at 95 to 105°C for 16 hours to make glycidyl methacrylate Addition reaction occurred at an addition molar ratio of 0.12 mol to 1 mol of the carboxyl group of the resin, and it was taken out after cooling. The weight-average molecular weight of the carboxyl group-containing photosensitive resin produced by the above reaction is about 10,000, the acid value i...
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