Composite multi-mode plasma surface processing device

A surface treatment device, plasma technology, applied in the direction of ion implantation plating, coating, metal material coating process, etc., can solve problems such as unfavorable workpieces and affect the performance of the film layer, so as to improve the bonding force of the film base and optimize the film. Layer structure and performance control, good effect of film layer performance

Inactive Publication Date: 2008-05-28
辽宁北宇真空科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The purpose of this invention is to provide a kind of complex multi-mode plasma surface treatment device, which can solve the problem of adopting a complex surface treatment process to process a workpiece. If the second process or other co

Method used

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  • Composite multi-mode plasma surface processing device
  • Composite multi-mode plasma surface processing device
  • Composite multi-mode plasma surface processing device

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Example Embodiment

[0007] Specific implementation mode 1: This embodiment will be described with reference to Figs. 1 to 3. This embodiment consists of a vacuum chamber 1, an upper cover of the vacuum chamber 2, a magnetron sputtering target 4, a low-energy ion source 5, a radio frequency antenna 6, and a high-voltage target platform 7. , Sealing insulator 8, center electrode 9, pulse bias power supply 10, metal ion implantation source 11, chassis 26, pneumatic device 12, pump set 13, vacuum cathode arc source 14; the vacuum cathode arc source 14 consists of one A straight tube vacuum cathode arc source 15 and a 90° elbow tube vacuum cathode arc source 16, the two magnetron sputtering targets 4, a straight tube vacuum cathode arc source 15, and a 90° elbow tube vacuum cathode arc source 16 , A metal ion implantation source 11, a low-energy ion source 5 and a group of pumps 13 are fixedly installed in the through hole on the outer wall of the vacuum chamber 1. A radio frequency antenna 6 is fixed in ...

Example Embodiment

[0008] Specific embodiment 2: This embodiment will be described with reference to FIG. 1. The pneumatic device 12 of this embodiment is composed of a cylinder 17 and a cylinder piston 18; one end of the cylinder piston 18 is fixedly connected to the upper cover 2 of the vacuum chamber, and the other of the cylinder piston 18 One end is installed in the air cylinder 17, and the air cylinder 17 is fixedly installed on the bottom frame 26. With this arrangement, the structure is simple and easy to operate, and the upper cover of the vacuum chamber can be opened and closed at any time. Other composition and connection relationship and

[0009] The specific embodiment one is the same.

Example Embodiment

[0010] Specific embodiment 3: This embodiment is described with reference to FIG. 1. The sealing insulator 8 of this embodiment is made of polytetrafluoroethylene insulating material or ceramic (glazed 95 porcelain) insulating material, and has good sealing performance. Other components and connection relationships are the same as those in the first or second embodiment.

[0011] Specific embodiment 4: This embodiment will be described with reference to Figures 1 and 2. The pump set 13 of this embodiment consists of a mechanical pump 19, a molecular pump 20, a first valve 21, a second valve 22, a flapper valve 23, and a grating valve 24. Composition; the output end of the mechanical pump 19 is connected to the grating valve 24 and the input end of the molecular pump 20 through the first valve 21 and the second valve 22, respectively, and the output end of the molecular pump 20 is connected to the input end of the flapper valve 23, The output end of the plug-in valve 23 is connecte...

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Abstract

A complex multi-mode plasma surface treatment installation relates to a plasma surface treatment installation which aims at the problem that when work pieces are processed via a complex surface treatment process, the work pieces need to be processed via different processes on two different devices, and the work pieces in the middle procedure are exposed to the air, forming disadvantageous foreign matters, which affects the property of final films. A magnetron sputtering target (4), vacuum cathodic arc source (14), metal ion implantation source (11), low-energy ion source (5) and a pump set (13) are fixedly installed on the outer wall of a vacuum chamber (1) inside which a radio frequency antenna (6) is fixedly installed, the upper end of a center electrode (9) passes through a sealed insulator (8) to be installed inside the vacuum chamber (1), the lower end of the center electrode is connected with a pulsed bias power supply (10), a high voltage target table (7) is fixed on the center electrode (9), and an upper cover (2) of the vacuum chamber is connected with a pneumatic device (12). The invention employs multiple generating means of particles, the work pieces can obtain thicker films as well as a variety of thicker films, thereby increasing the film-substrate cohesion and realizing the surface treatment of special shaped work pieces and the recombination of pluralities of processes.

Description

technical field [0001] The invention relates to a plasma surface treatment device. Background technique [0002] With the development of industry, people have put forward higher and higher requirements for the performance of the surface of industrial parts, so the surface modification technology of materials has received more and more attention, such as gas, metal ion implantation, nitriding, sputtering Deposition, cathodic arc injection / deposition, etc. Practical applications show that a single surface treatment technology is difficult to meet complex surface performance requirements, such as only ion implantation is difficult to obtain a thick surface modification layer that resists heavy loads, and magnetron sputtering deposition obtains a film-based combination of surface coatings. The force is very weak, so in order to obtain comprehensive surface properties, composite surface treatment has received more and more attention. The original composite process is generally ...

Claims

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Application Information

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IPC IPC(8): C23C14/00C23C14/35C23C14/48
Inventor 田修波杨士勤
Owner 辽宁北宇真空科技有限公司
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