Hydrophobic white carbon black and method for preparing same
A white carbon black, hydrophobic technology, applied in silicon oxide and other directions, can solve problems such as large environmental pollution, achieve the effect of low comprehensive cost, solve environmental pollution, and rich sources
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0018] Get 1000Kg of rice husks and burn them in a combustion furnace for 20 minutes to generate black carbon ash. Dilute 15Kg of sodium hydroxide with water at a temperature of 90°C and cook with alkali for 3 hours. Then, at a temperature of 80°C, dilute 1Kg of concentrated sulfuric acid to The concentration is 15%, treated with acid for 10 minutes, then diluted with water, the material obtained by pressure filtration, diluted with water and ground, and the ground material was dried in a drying tower at 250°C for 5 minutes, and then dried The final material was stirred, and 3Kg of hexamethylsiloxane was diluted by spraying method and then added for surface treatment.
Embodiment 2
[0020] Get 1000Kg of rice husks and burn them in a combustion furnace for 30 minutes to generate black carbon ash. Dilute 25Kg of sodium hydroxide with water at a temperature of 100°C and cook with alkali for 5 hours. Then, at a temperature of 100°C, dilute 2Kg of concentrated sulfuric acid to The concentration is 15%, treated with acid for 20 minutes, then diluted with water, the material obtained by pressure filtration, diluted with water and ground, and the ground material was dried in a drying tower at 300°C for 10 minutes, and then dried The final material was stirred, and 5Kg of octamethylsiloxane was diluted by spraying method and then added for surface treatment.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com