Device for automatically focusing and leveling

Abstract

The invention provides an automatic focusing and leveling device and is applied in a photoetching machine to measure the height value and lean degree of the surface of a silicon chip to be measured relative to the focal plane of a projection objective lens, therefore, the focusing and leveling of the silicon chip can be realized. The automatic focusing and leveling device is provided with an optical module and a control module, both of which are connected with each other through electricity, wherein, the optical module adopts a plate glass and gets rid of limitation of mechanical size, therefore, the invention can realize high-frequency vibration more easily and is easy to be regulated.

Description

Technical field [0001] The invention relates to an automatic focusing and leveling device, in particular to an automatic focusing and leveling device used on a photoetching machine. Background technique [0002] With the vigorous development of the electronics industry, the application of integrated circuits has become more and more extensive, followed by the high precision of its production. The lithography machine is the most critical equipment in all aspects of integrated circuit production. Lithography technology is the basis of large-scale integrated circuit manufacturing and has become the core driving force to promote the development of integrated circuits. Its main function is to image the pattern on the mask on the silicon wafer through exposure. Since the surface of the silicon wafer is coated with photosensitive photoresist, when the pattern on the reticle is imaged on the silicon wafer, the photoresist at the corresponding position will produce a photochemical reactio...

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Problems solved by technology

However, when the area where the measurement points are distributed is relatively large, the diameter of the required vibration mirror will also incr

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