High amino content ordered mesoporous silicon dioxide film and its preparation method and application
A technology of mesoporous silica and silica, applied in the directions of silica, silica, chemical instruments and methods, etc., can solve the problem of difficulty in obtaining order, small film pore size, mesoporous pore size and pore volume. and other problems, to achieve the effects of excellent assembly and fixation performance, orderly pore structure, and smooth and continuous surface.
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Embodiment 1
[0019] An ordered mesoporous silica film with high amino content, the mass content of amino groups in the film is 9%, and the specific surface area is 690m 2 / g, the distribution of organic groups on the surface of the mesoporous film is 4.8 amino groups / nm 2 , The mesopore diameter is 2.1nm. This silicon dioxide thin film is made by following method:
[0020] Mix 4.47mL tetraethyl orthosilicate (TEOS), 8.7mL absolute ethanol (EtOH), 0.025mL dilute hydrochloric acid (0.1mol / L), and 0.9mL deionized water. Meet: 0.4TEOS: 3C 2 h 5 OH: 5×10 -5 HCl:1H 2 O; after stirring evenly, heat to 60°C for reflux hydrolysis for 60 minutes to obtain clear, partially hydrolyzed silica sol; after the silica sol is cooled, add 0.45mL deionized water and 3.15mL concentrated hydrochloric acid (mass concentration is 36%), stir After 10 minutes, add 35 mL of absolute ethanol to dilute the mixed sol, and slowly add 7 mL of 3-aminopropyltriethoxysilane (APTES) dropwise to the diluted sol in an ic...
Embodiment 2
[0022] An ordered mesoporous silica film with high amino content, the mass content of amino in the film is 7.5%, and the specific surface area is 705m 2 / g, the distribution of organic groups on the surface of the mesoporous film is 4 amino groups / nm 2 , Mesopore diameter is 3.2nm. This silicon dioxide thin film is made by following method:
[0023] Mix 5.58mL tetraethyl orthosilicate (TEOS), 8.7mL absolute ethanol (EtOH), 0.025mL dilute hydrochloric acid (0.1mol / L), and 0.9mL deionized water. Meet: 0.5TEOS: 3C2 h 5 OH: 5×10 -5 HCl:1H 2 O, after stirring evenly, heat to 60°C for reflux hydrolysis for 60 minutes to obtain clear, partially hydrolyzed silica sol; after the silica sol is cooled, add 0.95mL deionized water and 2.65mL concentrated hydrochloric acid (mass concentration is 36%), stir After 10 minutes, add 30 mL of absolute ethanol to dilute the mixed sol, and slowly add 5.84 mL of 3-aminopropyltriethoxysilane (APTES) dropwise to the diluted sol in an ice-water ba...
Embodiment 3
[0025] An ordered mesoporous silica film with high amino content, the mass content of amino in the film is 6%, and the specific surface area is 680m 2 / g, the distribution of organic groups on the surface of the mesoporous film is 3.2 amino groups / nm 2 , The mesopore diameter is 8.4nm. This silicon dioxide thin film is made by following method:
[0026] Mix 6.7mL tetraethyl orthosilicate (TEOS), 8.7mL absolute ethanol (EtOH), 0.025mL dilute hydrochloric acid (0.1mol / L), and 0.9mL deionized water. Meet: 0.6TEOS: 3C 2 h 5 OH: 5×10 -5 HCl:1H 2 O, after stirring evenly, heat to 60°C for reflux and hydrolyze for 60 minutes to obtain clear, partially hydrolyzed silica sol; after the silica sol is cooled, add 1.45mL deionized water and 2.15mL concentrated hydrochloric acid (mass concentration is 36%), stir After 10 minutes, add 25 mL of absolute ethanol to dilute the mixed sol, slowly add 4.67 mL of 3-aminopropyltriethoxysilane (APTES) dropwise to the diluted solution in an ice...
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