Substrate processing device
A substrate processing device and technology for substrates, which are applied in the directions of transportation and packaging, cleaning flexible items, lighting and heating equipment, etc., can solve the problems of reduced cleaning ability, thick cleaning liquid L thickness, and reduced cleaning pressure, etc. The effect of cost reduction, effective cleaning process, and shortening of the conveying path
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[0048] Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a plan view of a coating and development processing system applicable to the substrate processing apparatus of the present invention.
[0049] The coating and development processing system 10 is installed in a clean room, for example, a glass substrate for LCD is used as a substrate to be processed, and cleaning, resist coating, prebaking, developing and A series of processing such as post-baking. Exposure processing is performed in an external exposure device 12 provided adjacent to the system.
[0050] The coating and development processing system 10 is equipped with a horizontally long process station (processstation) (P / S) 16 at the center, and cassette stations (cassettestation) (C / S) 14 are arranged at both ends of its length direction (X direction). and interface station (I / F) 18 .
[0051] The cassette station (C / S) 14 has an aisle for loading and unloading ...
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