Developing solution composition

A technology of a composition and a developer, which is applied to the composition of a high-concentration developer and the developing application of a photoresist for a color filter, can solve the problems of the developer being cloudy, generating residues, and not being able to be greatly improved. , to achieve the effect of increasing the cloud point and increasing the concentration

Inactive Publication Date: 2008-10-22
ETHICAL INT WAREHOUSING TRADING SHANGHAI
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Problems solved by technology

[0007] However, this type of alkaline developer, because of the addition of a non-ionic surfactant, will inherit the cloud point representing one of the properties of the surfactant (when the temperature of the alkaline developer increases or the concentration increases, the developer will change. cloudy temperature)
In particular, the inorganic alkali developer occasionally has the following problems: the alkaline developer may become cloudy and stratified during storage or transportation, and then precipitate. Correct, the concentration and composition ratio of the upper and lower layers are different, and what is more serious is that in the transportation pipeline, due to the change of temperature, the layers are separated out, and they accumulate in the dead corner of the pipeline to block the pipeline.
[0008] It is not easy to find the phenomenon of non-ionic surfactant precipitation and stratification at low concentrations in general alkaline developing solutions. Once a high-concentration alkaline developing solution ne

Method used

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Embodiment 1-30

[0049] Preparation of developer composition

[0050] (a) basic compound, (b) nonionic surfactant and (c) carboxylic acid compound or cationic salt thereof according to the weight percentage of table 1, then add ultrapure water and mix and be prepared into an aqueous solution with a weight of 100 grams .

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Abstract

The invention relates to developing solution constituent. The compositions by weight portion of the developing solution constituent are: (a), 0.1 to 20 portions of alkaline compounds; (b), 0.1 to 20 portions of non-ionic surface active agent; (c), 0.1 to 10 portions of monocarboxylic acid compounds with the structure of (I): RCOOR', wherein, R refers to fatty groups or aromatic series which contain 5 to 12 carbon numbers and R' refers to hydrogen, alkali metals or alkaline-earth metal cations; and (d), the balance being water. The weight is calculated based on 100 portions of the developing solution constituent.

Description

technical field [0001] The present invention relates to a photoresist (Photoresist) developer (Developer) composition, in particular to a high-concentration developer composition (Developer), which can be used in integrated circuits (IC), printed circuit boards (PCB), liquid crystal display (LCD) or color filter (CF), especially suitable for the development of photoresist for color filter. Background technique [0002] Generally, in the preparation processes of integrated circuits, printed circuit boards, and liquid crystal displays, in order to obtain fine images, radiation-sensitive compositions such as photoresists are often used to form thin films on substrates by coating. Develop with a developer to remove unnecessary parts of the coating film to obtain a good image. [0003] Commonly used developing methods include techniques such as immersion developing, shaking developing, spray developing and static developing. Because the general photoresist is made of alkali-sol...

Claims

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Application Information

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IPC IPC(8): G03F7/32
Inventor 刘大铭李晏成陈俊廷
Owner ETHICAL INT WAREHOUSING TRADING SHANGHAI
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