Developing solution composition
A technology of a composition and a developer, which is applied to the composition of a high-concentration developer and the developing application of a photoresist for a color filter, can solve the problems of the developer being cloudy, generating residues, and not being able to be greatly improved. , to achieve the effect of increasing the cloud point and increasing the concentration
Inactive Publication Date: 2008-10-22
ETHICAL INT WAREHOUSING TRADING SHANGHAI
View PDF1 Cites 14 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0007] However, this type of alkaline developer, because of the addition of a non-ionic surfactant, will inherit the cloud point representing one of the properties of the surfactant (when the temperature of the alkaline developer increases or the concentration increases, the developer will change. cloudy temperature)
In particular, the inorganic alkali developer occasionally has the following problems: the alkaline developer may become cloudy and stratified during storage or transportation, and then precipitate. Correct, the concentration and composition ratio of the upper and lower layers are different, and what is more serious is that in the transportation pipeline, due to the change of temperature, the layers are separated out, and they accumulate in the dead corner of the pipeline to block the pipeline.
[0008] It is not easy to find the phenomenon of non-ionic surfactant precipitation and stratification at low concentrations in general alkaline developing solutions. Once a high-concentration alkaline developing solution needs to be prepared, the hydrophobic groups of non-ionic surfactants interact with water The problem of layering and precipitation if the hydrophilicity is greater than that of the hydrophilic group
[0009] Therefore, the concentration of this type of alkaline developer will be limited by its cloud point, and cannot be greatly increased
Therefore, a considerable part of this type of developer is usually a solvent. If you try to increase the concentration of the developer to reduce the volume of the solvent and reduce the freight, when you try to increase the concentration of the developer, the cloud point will drop to room temperature. Below, but encounter the problem of poor solubility and stratification and precipitation
[0010] There is a way to increase the cloud point of the alkaline developer, which is to use a nonionic surfactant with a high cloud point. However, adding a nonionic surfactant with a high cloud point will cause other side effects, such as damage to the photoresist film. Residual surfactants, or residues, etc.
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1-30
[0049] Preparation of developer composition
[0050] (a) basic compound, (b) nonionic surfactant and (c) carboxylic acid compound or cationic salt thereof according to the weight percentage of table 1, then add ultrapure water and mix and be prepared into an aqueous solution with a weight of 100 grams .
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More
Abstract
The invention relates to developing solution constituent. The compositions by weight portion of the developing solution constituent are: (a), 0.1 to 20 portions of alkaline compounds; (b), 0.1 to 20 portions of non-ionic surface active agent; (c), 0.1 to 10 portions of monocarboxylic acid compounds with the structure of (I): RCOOR', wherein, R refers to fatty groups or aromatic series which contain 5 to 12 carbon numbers and R' refers to hydrogen, alkali metals or alkaline-earth metal cations; and (d), the balance being water. The weight is calculated based on 100 portions of the developing solution constituent.
Description
technical field [0001] The present invention relates to a photoresist (Photoresist) developer (Developer) composition, in particular to a high-concentration developer composition (Developer), which can be used in integrated circuits (IC), printed circuit boards (PCB), liquid crystal display (LCD) or color filter (CF), especially suitable for the development of photoresist for color filter. Background technique [0002] Generally, in the preparation processes of integrated circuits, printed circuit boards, and liquid crystal displays, in order to obtain fine images, radiation-sensitive compositions such as photoresists are often used to form thin films on substrates by coating. Develop with a developer to remove unnecessary parts of the coating film to obtain a good image. [0003] Commonly used developing methods include techniques such as immersion developing, shaking developing, spray developing and static developing. Because the general photoresist is made of alkali-sol...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More
IPC IPC(8): G03F7/32
Inventor 刘大铭李晏成陈俊廷
Owner ETHICAL INT WAREHOUSING TRADING SHANGHAI
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Patsnap Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com