Method for preparing magnetic array

Abstract

The invention pertains to the technical field of electronic materials, which relates to a method for preparing a planar magnetic array device. First, a permanent magnet array motherboard is fixed on the lower surface of a base; then the upper surface of the base is evenly coated with a nano-ferrite / photosensitive polymer composite material and put stilly until the solidification of the magnetic particles of the nano-ferrite is realized by exposure after the magnetic particles of the nano-ferrite are distributed according to the array picture of the motherboard under the effect of the magneticfield of the permanent magnet array motherboard; finally, the permanent magnet array motherboard is removed, thus obtaining corresponding magnetic arrays. The preparation method actually utilizes thepermanent magnet array motherboard to copy the magnetic arrays; simultaneously, the preparation method utilizes a photosensitive polymer to fix the magnetic particles of the nano-ferrite in the magnetic arrays and solves the technical problem of the prior art that 'the device is invalidated due to the reduction of image resolution'. The preparation method has simple process, easy operation and low cost, does not need photoetching, is suitable for large-scale production and has wide application prospect in the fields of micro-electronics, photoelectron, magnetic recording and microwave devices.

Description

technical field [0001] The invention belongs to the technical field of electronic materials and relates to a preparation method of a planar magnetic array device. Background technique [0002] With the development of miniaturization of devices and complete machines, micro / nano technology for the purpose of processing micro / nano mechanisms and systems has emerged under this background, especially the rapid development of MEMS technology. MEMS devices have outstanding advantages such as small size, light weight, low energy consumption, small inertia, and short response time. At the same time, multiple micro-mechanisms with different functions, different sensitive directions or actuation directions can be integrated on a large scale, and can Batch replication and large-scale production are carried out through micro-electroforming, so it has huge market value in medical treatment, biotechnology, space technology, wireless communication, etc. [0003] As a basic structure in mic...

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Problems solved by technology

This type of method mainly has the following disadvantages: 1. Since the single-layer magnetic material film on the surface of the substrate is prepared by self-assembly technology or spin coating method, its stability is poor, especially in the construction of the magnetic array. The interaction between the magnetic particles in the array will lead to aliasing of the array pattern, which will reduce the resolution of the pattern and greatly increase the failure rate of the device; 2. In the whole preparation process, the photolithography step is indispensable, so the process is still relatively complicated; 3. , Since most of the single-layer magnetic material film is unnecessary for making such an array, it still needs to be etched by photolithography, which causes a lot of waste of raw materials

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