Method for producing silane gas

A production method and gas technology, applied in the direction of silicon hydride, etc., can solve the problems of low product purity, the method cannot meet the industrial production, and the yield is low.

Inactive Publication Date: 2009-03-25
王少志
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide a production method of silane gas in order to solve the problems of low pro

Method used

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Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0007] Specific Embodiment 1: The production method of silane gas in this embodiment is realized according to the following steps: 1. Weigh 1 part of silicon powder, 1 to 1.5 parts of magnesium powder and 1.5 to 2 parts of ammonium chloride according to the ratio of parts by weight; 2. Mix the weighed silicon powder and magnesium powder, and then put the temperature at 400-600°C and a vacuum of 500-600Pa to react for 2-4 hours to obtain magnesium silicide; 3. Mix the weighed ammonium chloride Mix with magnesium silicide in a reactor with liquid ammonia as the medium, react at -50 to -100°C for 4 to 6 hours, and the resulting reactant is absorbed by 3A molecular sieves and purified by deep cooling to obtain silane gas; among them, step 3 Medium and deep cooling and purification adopt liquid nitrogen cooling distillation device.

specific Embodiment approach 2

[0008] Embodiment 2: The difference between this embodiment and Embodiment 1 is that in step 1, 1 part of silicon powder, 1.2 parts of magnesium powder and 1.8 parts of ammonium chloride are weighed in parts by weight. Other steps and parameters are the same as those in Embodiment 1.

specific Embodiment approach 3

[0009] Specific embodiment 3: The difference between this embodiment and specific embodiment 1 is that in step 2, the temperature is 500° C. and the vacuum degree is 550 Pa to react for 3 hours. Other steps and parameters are the same as those in Embodiment 1.

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Abstract

The invention discloses a production method for silane gas, relating to a production method for gas. The invention solves the problems that the existing method for producing silane gas has low product purity and low yield, and the method can not meet the need of commercial process. The method comprises the following steps: 1. silica fume, magnesium powder and ammonium chloride are weighed and taken out; 2. magnesium silicide is obtained after the silica fume is mixed and reacted with the magnesium powder; and 3. the weighed and taken out ammonium chloride and the magnesium silicide are mixed and reacted in a reactor which takes liquid ammonia as the media, and then silane gas is obtained after the obtained reactant undertakes molecular sieve adsorption and deep cooling purification. The obtained silane gas has the purity of 99.99 percent and the yield of over 95 percent, and the method also meets the need of commercial process.

Description

technical field [0001] The invention relates to a method for producing gas. Background technique [0002] Silane is an important raw material for the synthesis of silane coupling agents, and can also be used to manufacture silicone oil, polysilane and resins. At present, in the method for producing silane gas, the purity of the final product silane gas is low, the yield is low, and the method cannot meet the needs of industrial production. Contents of the invention [0003] The object of the present invention is to provide a production method of silane gas in order to solve the problems of low product purity, low yield and the method cannot meet the needs of industrial production in the existing method for producing silane gas. [0004] The production method of silane gas is realized according to the following steps: 1. Take 1 part of silicon powder, 1-1.5 parts of magnesium powder and 1.5-2 parts of ammonium chloride according to the ratio of parts by weight; 2. Take the...

Claims

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Application Information

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IPC IPC(8): C01B33/04
Inventor 王少志
Owner 王少志
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