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Ultrafast electron diffraction system based on X waveband photocathode microwave electronic gun

A microwave electron gun, X-band technology, used in material analysis, measurement devices, instruments, etc. using wave/particle radiation, can solve problems such as inability to obtain electron diffraction sample spots, total exposure time, and sample consumption. System stability is harsh. , to achieve the effect of saving experimental time and number of samples and alleviating harsh requirements

Active Publication Date: 2009-04-08
TSINGHUA UNIV
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Problems solved by technology

This puts forward strict requirements on the total exposure time, sample consumption, and system stability, and it is impossible to obtain a single-shot electron diffraction sample spot.

Method used

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  • Ultrafast electron diffraction system based on X waveband photocathode microwave electronic gun

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Embodiment Construction

[0017] A schematic diagram of the system composition of the present invention is shown in FIG. 1 . Among them, 1 is an ultrafast laser system, which can generate laser pulses of tens of fs to several ps, which are used to excite the microstructure changes in the sample and generate electron beams in the photocathode gun through the photoelectric effect, respectively. 2 is an X-band pulsed microwave power system, which supports the work of the photocathode gun 3 and the microwave deflection cavity 6 . There is precise time synchronization between 1 and 2, and the synchronization accuracy that can be achieved by using the high-order harmonic phase-locked loop control method is hundreds of femtoseconds or even better. 3 is an X-band photocathode gun. 4 is a solenoid coil of a static magnetic field, which is used to focus the electron bunch and control the change of the beam spot and emittance of the electron bunch along the beam line. 5 is the diffraction sample to be studied. ...

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Abstract

The invention provides an ultra-fast electronic diffraction system based on an X-waveband photocathode microwave electron gun, belonging to the technical field of ultra-fast electronic diffraction; the ultra-fast electronic diffraction system is characterized in that the X-waveband photocathode microwave electron gun replaces a DC high-voltage photocathode microwave electron gun in the existing Kev ultra-fast electronic diffraction system and is used as an electron source; and correspondingly, an X-waveband pulse microwave power unit is adopted and high-quality electron beams ranging from 0.5MeV to 1.5MeV is easily obtained, thus leading the electron number in each electron beam bunch to be improved to 2 to 3 magnitude and correspondingly saving a plurality of samples and testing time of the diffraction samples to be researched, thereby leading the obtaining of single diffraction sample spot to be possible.

Description

technical field [0001] The invention belongs to the technical field of ultrafast electron diffraction. Background technique [0002] Ultrafast electron diffraction (UED) technology is a powerful tool for studying the microstructure change process in chemistry, biology, materials and other disciplines. It is the product of the combination of ultrafast laser technology and photocathode-based electron source technology. Since the UED technology was proposed and implemented in the 1980s, it has been used to study important and important aspects such as the formation and breaking of chemical bonds, the structural evolution of biological macromolecules, the connection between molecular structure and molecular function, and the melting and vibration of crystal lattices. Basic scientific problems have produced a series of important results, which have deepened human understanding of related issues. At present, UED systems based on DC high-voltage technology electron sources can ach...

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Application Information

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IPC IPC(8): G01N23/207G01N13/10
Inventor 唐传祥王西杰李任恺陈怀璧黄文会
Owner TSINGHUA UNIV
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