Thermosetting composition for optical semiconductor, die bond material for optical semiconductor device, underfill material for optical semiconductor device, sealing agent for optical semiconductor de
A technology of optical semiconductor components and optical semiconductors, which is applied in the fields of semiconductor/solid-state device parts, semiconductor/solid-state device manufacturing, semiconductor devices, etc. changes, etc.
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Synthetic example 1
[0252] Add dimethyldimethoxysilane (750g) and 3-glycidoxypropyl(methyl)dimethoxysilane (150g) to a 2000mL separable flask equipped with a thermometer and a dripping device. , Stir at 50°C. Potassium hydroxide (1.9g) / water (250g) was slowly added dropwise thereto, and after the dropwise addition, the mixture was stirred at 50°C for 6 hours. Acetic acid (2.1 g) was added thereto, volatile components were removed under reduced pressure, and potassium acetate was filtered to obtain a polymer. The obtained polymer was washed with hexane / water, volatile components were removed under reduced pressure, and polymer A was obtained. The molecular weight of polymer A is Mn=11000, Mw=25000, and according to 29Si-NMR, it is (Me 2 SiO 2 / 2 ) 0.90 (EpMeSiO 2 / 2 ) 0.10 , The content of 3-glycidoxy propyl group is 14 mol%, and the epoxy equivalent is 760g / eq. The alkoxy content is 0.2 mol%.
[0253] In addition, the molecular weight is that tetrahydrofuran (1 mL) was added to polymer A (10 mg), stirr...
Synthetic example 2
[0255] Add dimethyldimethoxysilane (540g), 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane (60g) to a 2000mL separable flask equipped with a thermometer and a dripping device. ), stirring at 50°C. Potassium hydroxide (1.3g) / water (175g) was slowly added dropwise thereto, and after the dropwise addition, the mixture was stirred at 50°C for 6 hours. Acetic acid (1.4 g) was added thereto, volatile components were removed under reduced pressure, and potassium acetate was filtered to obtain a polymer. The obtained polymer was washed with hexane / water, volatile components were removed under reduced pressure, and polymer B was obtained. The molecular weight of polymer B is Mn=2100, Mw=7300, and according to 29Si-NMR, it is (Me 2 SiO 2 / 2 ) 0.94 (EpSiO 3 / 2 ) 0.06 , The 2-(3,4-epoxycyclohexyl) ethyl content is 9 mol%, and the epoxy equivalent is 1270 g / eq. The alkoxy content is 1.5 mol%.
[0256] In addition, the molecular weight, epoxy equivalent, and alkoxy content of polymer B were obtained...
Synthetic example 3
[0258] Add dimethyldimethoxysilane (440g) and 3-glycidoxypropyltrimethoxysilane (160g) to a 2000mL separable flask equipped with a thermometer and a dripping device, at 50℃ Stir. Potassium hydroxide (1.2g) / water (170g) was slowly added dropwise thereto, and after the dropwise addition, the mixture was stirred at 50°C for 6 hours. Acetic acid (1.3 g) was added thereto, volatile components were removed under reduced pressure, and potassium acetate was filtered to obtain a polymer. The obtained polymer was washed with hexane / water, volatile components were removed under reduced pressure, and polymer C was obtained. The molecular weight of polymer C is Mn=2000, Mw=3800, and according to 29Si-NMR, it is (Me 2 SiO 2 / 2 ) 0.83 (EpSiO 3 / 2 ) 0.17 The content of 3-glycidoxy propyl group is 22 mol%, and the epoxy equivalent is 550g / eq. The alkoxy content is 4 mol%.
[0259] In addition, the molecular weight, epoxy equivalent, and alkoxy content of polymer C were obtained in the same manner as...
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