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Method for film formation, mold, and method for manufacturing mold

A film-forming method and mold technology, applied in the field of mold manufacturing, can solve problems such as inability to improve surface roughness

Inactive Publication Date: 2009-06-10
KONICA MINOLTA OPTO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This will lead to a problem that even if the molding transfer surface is finished by mechanical processing such as grinding or grinding, the surface roughness cannot be improved

Method used

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  • Method for film formation, mold, and method for manufacturing mold
  • Method for film formation, mold, and method for manufacturing mold
  • Method for film formation, mold, and method for manufacturing mold

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0080] The mold raw material 10 is made of sintered silicon carbide, and after the shielding member 11 is fitted with it, according to figure 1 The manner shown is loaded onto the pedestal 7 . The exhaust pump P was operated so that the air pressure in the reaction chamber 1 was 13.3-40 kPa. On the other hand, 3 moles of hydrogen gas is mixed as a carrier gas with respect to 1 mole of silicon tetrachloride gas and methane gas, and the vicinity of the mold material 10 is heated to 1200°C with the carbon heater 6, and thermal CVD treatment is performed to form carbonization. Silicon film. In addition, the film-forming surface is ground and processed into an aspherical shape, and then ductile pattern cutting is performed with a diamond tool. Then, apply a release film of about 1 μm on the molding transfer surface. On the molding transfer surface 10a, an extremely good surface roughness with almost no depressions was obtained, and the shape accuracy of the processed molding tr...

Embodiment 2

[0083] Under the same conditions as in Example 1, 5 moles of hydrogen gas was mixed as a carrier gas with respect to 1 mole of silicon tetrachloride gas and methane gas, and a film was formed on the molding transfer surface 10a by thermal CVD. Also, by molding the optical element using the mold material 10 and transferring the aspheric optical surface through the molding transfer surface 10a, a good surface without protrusions corresponding to the recessed parts is obtained. The film forming speed has dropped from the current 100μm / hr to 65μm / hr, but the molding results of other optical components are good.

Embodiment 3

[0085] Under the same conditions as in Example 1, 8 moles of hydrogen gas was mixed as a carrier gas with respect to 1 mole of silicon tetrachloride gas and methane gas, and a film was formed on the molding transfer surface 10a by thermal CVD. Also, by molding the optical element using the mold material 10 and transferring the aspheric optical surface through the molding transfer surface 10a, a good surface without protrusions corresponding to the recessed parts is obtained. The film forming speed has been reduced from the current 100μm / hr to 20μm / hr, but the molding results of other optical components are good.

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PUM

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Abstract

An objective is to provide a film formation method with which a layer having reduced defects, a die obtained by the film formation method, and a method of manufacturing the die. Free carbons increase in the case of reducing hydrogen gas as a carrier gas, so that concave portions are generated and increased during the molding transfer surface process. It was commonly known that hydrogen gas employed for the thermal CVD was set to 2 moles, but it was found out that generation of concave portions was possible to be largely inhibited by setting hydrogen gas to at least 3 moles. However, a level of up to 8 moles is preferable in view of practical use, since dilution of the total raw material gas causes a decline of reaction speed in the case of too much increase of hydrogen gas, resulting in the low speed of film formation.

Description

technical field [0001] The present invention relates to a film forming method capable of obtaining a film with few defects, a mold obtained by the film forming method, and a method of manufacturing the mold. Background technique [0002] When ceramic materials are used for optical elements or molds for molding them, it can be said that ceramic materials are very advantageous compared to other materials in terms of heat resistance, quality, and dimensional stability. For example, when ceramic materials are directly used in molds for optical element molding, compared with superhard materials, ceramic materials only have a small specific gravity of 1 / 5, so a very lightweight mold can be obtained, and it also contributes to the stability of its supporting members. Lightweight and miniaturized. In addition, when tungsten carbide is used as a superhard material, since the oxidation resistance of tungsten carbide is not as high as that of ceramics, once the temperature of the gas ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/42C23C16/32C03B11/00
CPCC23C16/56C23C16/325C23C16/042
Inventor 细江秀松田裕之
Owner KONICA MINOLTA OPTO