Memory device, method and aligning control system for photoetching aligning data detection

A technology for data inspection and lithography alignment, which is applied in the general control system, control/adjustment system, exposure device for photo-plate making process, etc., can solve the problems of wrong alignment results, uncertain read and write timing, and inconsistent timing, etc., to achieve Avoid the effect of reading

Active Publication Date: 2009-09-09
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF1 Cites 16 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the above patent, since the sampling data of the data acquisition module cannot be transmitted immediately, it is necessary to store the collected data in a cache
Due to the limited storage space of the cache and the uncertain timing of reading and writing, two unexpected phenomena may occur: 1. data overflow (data that has not been read is overwritten); 2. reading a piece of unstored valid data At this time, when the data processing module applies for light intensity data, it will get a light intensity data that is inconsistent with the position data or has a wrong value, which will lead to an error in the alignment result.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Memory device, method and aligning control system for photoetching aligning data detection
  • Memory device, method and aligning control system for photoetching aligning data detection
  • Memory device, method and aligning control system for photoetching aligning data detection

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] Such as figure 2 As shown, the storage device for lithography alignment data inspection of the present invention is a box part in the figure, at least including: A / D (analog-to-digital) sampling module for collecting data of off-axis alignment optical subsystems ;A write pointer, used to write the data collected by the A / D sampling module into the ring buffer queue; a read pointer, used to read the data in the ring buffer queue to the data output register, when the IDB bus sends light intensity data When applying, the data of the data output register is input to the data processing module (not shown); a ring buffer queue is used to cache light intensity data; a read-write pointer distance register is used to record the difference between read and write times, thereby Determine the reading and writing status of the ring buffer queue to avoid data overflow or invalid data misreading; a data output register is used to record the light intensity data in the ring buffer que...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a memory device, a method and an aligning control system for the photoetching aligning data detection. The device comprises a modulus sampling module, an annular buffer alignment, a data output register, a state register, a write pointer, a read pointer and a read-write pointer distance register. The memory device, the method and the aligning control system can avoid reading invalid light-intensity data, judge the overflowing state of data and prevent error aligning result from being used for overlay.

Description

technical field [0001] The present invention relates to the technical field of optical equipment, in particular to a storage device and method for lithography alignment data verification and an alignment control system including the storage device. Background technique [0002] Overlay accuracy is one of the key indicators of lithography machines. In order to achieve high overlay accuracy, the lithography machine needs a special alignment system. figure 1 It is a structural schematic diagram of the alignment system of the lithography machine. The alignment system enables on-axis and off-axis alignment. The light source for coaxial alignment is provided by the illumination subsystem 1, and the light IL is projected onto the reticle 2 attached to the mask table 3 along the optical axis AX, and irradiates the reference plate 8 fixed on the wafer stage 7 through the projection optical subsystem 4 , and transmit the light intensity signal to the alignment signal processing sub...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F9/00G06F5/06G05B19/048
Inventor 陈延太韦学志
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products