Vacuum ultraviolet flat light source

Abstract

The invention discloses a vacuum ultraviolet flat light source which comprises a front base plate and a rear base plate, wherein the front base plate is made of quartz glass, and a discharge cavity is arranged between the front base plate and the rear base plate; the front base plate is provided with paired parallel electrodes and adopts surface discharge, or the electrodes are arranged on the front base plate and the rear base plate, and an opposite type discharge mode is adopted; the surfaces of the electrodes are also provided with dielectric layers which are provided with protective films; the discharge cavity is filled with working gas with certain air pressure, and the working gas with certain air pressure can be formed by the mixed gas of Ne gas and Xe gas. When alternating-current pulses are brought between the electrodes, the working gas discharges, and 147nm and 172 nm vacuum-ultraviolet light is continuously generated under the action of keeping current pulses and sent to the outer surface of the vacuum ultraviolet flat light source, which needs to be processed, by the quartz base plates. The invention can generate a surface light source of the vacuum-ultraviolet light, thereby having superiority for processing surfaces with large areas; and the invention can generate single-surface and double-surface vacuum ultraviolet flat light sources, thereby being suitable for different application occasions.

Description

technical field [0001] The invention relates to a flat panel light source of ultraviolet light, in particular to a flat panel light source of plasma generating deep ultraviolet light, in particular to a flat panel light source of plasma with MgO thin film producing 147nm and 172nm ultraviolet light. Background technique [0002] Ultraviolet light sources have important applications in surface treatment such as surface activation, surface modification, surface cleaning, decomposition and oxidation of organic matter. In semiconductor manufacturing, ultraviolet light sources are also widely used, such as photochemical vapor deposition (Photo-CVD) Fabrication of coatings, modification of chemical structures with UV light, surface activation, and more. The usual wavelengths of ultraviolet light are 254nm, 302nm, and 365nm. These ultraviolet lights can propagate in the air and pass through many materials, so they are called ordinary ultraviolet light sources, and ordinary glass is...

AI Technical Summary

Problems solved by technology

At present, the vacuum ultraviolet light source is tubular, which can constitute a point source or a line source, and there are certain limitations in the demand for large areas.

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