79results about How to "Reduce ignition voltage" patented technology

A smart system locks a door of a vehicle when there is a user's instruction to lock the door when a first portable device in which first identification information is stored is outside the vehicle and a second portable device in which second identification information is stored is inside the vehicle, and controls the power supply state from a normal state to a power supply continuation state in which power continues to be supplied only to a predetermined power supply continuation device in the vehicle.

The invention relates to a multilayer discharge gap type surge protection device, which is suitable for overvoltage protection on an alternating-current or direct-current circuit. The multilayer discharge gap type surge protection device comprises n discharge gaps and n-1 trigger circuits, wherein n is an integer of being more than or equal to 2; the n discharge gaps are connected in series to form an overvoltage bleeder circuit; two ends of the overvoltage bleeder circuit are provided with connecting terminals, and the overvoltage bleeder circuit is used for connecting with a protected alternating-current or direct-current circuit; one end of each of the n-1 trigger circuits is respectively connected with a conductive member between the corresponding discharge gaps, and other ends of the n-1 trigger circuits are connected together and connected with the outer end part of the first discharge gap F1; and all the trigger circuits have same structure and are connected in parallel through a capacitor and a resistor to form an RC (Resistor-Capacitor) circuit.

Disclosed is the magnesia integument phosphor powder covered with magnesia on the surface of the phosphor powder.The method of integument comprising: preparing pH buffer with the concentration between 0.1-0.2M by employing conjugate acid and base system with the pH value between 8.0-12.0, weighing relevant quantity of water-soluble magnesium salt according to the proportion between magnesia and phosphor powder by weight (0.25~15): 100, preparing water-soluble magnesium salt volumetric solution with the concentration between 0.01~1M; preparing phosphor powder suspension with the concentration 0.2~5% by adding the phosphor powder into the buffer, stirring, dispersing with supersonic wave to make the phosphor powder dispersed in the buffer; heating the phosphor powder suspension to 20~70 DEG C and keeping the temperature, stirring with speed 100r/m~ 300r/m and dropping the water-soluble magnesium salt volumetric solution into the phosphor powder suspension at the speed of 2~15ml/min, then keeping the temperature and stirring for 30~180 minutes and getting the integument phosphor powder suspension, separating, washing, dewatering and drying at 60-120DEG C, making the integument phosphor powder moisture percentage below 0.25%,incandescing at 200~400 DEG C for 1~3 hours and air cooling in the furnace.

An elongated electrode of a dielectric barrier discharge lamp is divided into two component electrodes (A, A') by a gap (L). The two component electrodes (A, A') are driven in an ignition phase in such a way that an auxiliary discharge that facilitates the ignition of the main discharge (E) in the region of the electrode gap (L), in particular when the lamp is in the dark. In normal operation, the component electrodes (A, A') are driven in such a way that they contribute to the generation of the main discharge (E).

A ceramic gas discharge metal halide (CDM) lamp (10) capable of retrofitting into existing high pressure iodide (HPI) metal halide and high pressure mercury vapor (HP) lamp fixtures for significient energy savings, the CDM lamp (10) having a ceramic discharge vessel (12) containing a pair of discharge electrodes (17, 18), a Penning mixture of the rare gases neon and argon, and a chemical fill which includes an oxygen dispenser and which restricts strong oxygen binders to 5 mole percent or less. In a preferred embodiment, the discharge vessel (12) has an aspect ratio R of less than 2, a wall thickness t of up to 1.2 mm, a spacing d between the discharge electrodes (17, 18) of up to 14 mm, and a passive antenna (26) on the outer wall of the discharge vessel (12), with the shortest distance a between a discharge electrode (17, 18) and the floating antenna (26) of up to 7 mm.

The invention discloses an ITO thin film sputtering process and an ITO thin film sputtering device. The ITO thin film sputtering process comprises steps of: 1) limiting the output voltage of a direct-current sputtering power supply to be lower than the nominal voltage of the direct-current sputtering power supply, and applying a preset power to a target material through the direct-current sputtering power supply; 2) feeding process gas into a reaction cavity, wherein the pressure of the process gas in the reaction cavity is set to be a preset pressure capable of glow starting of the process gas so that the process gas can be subjected to glow starting in the reaction cavity; and 3) lowering the pressure of the process gas in the reaction cavity to be lower than the preset pressure, applying a sputtering power to the target material through the direct-current sputtering power supply and sputtering, wherein the sputtering power is not less than the preset power and is not more than the rated power of the sputtering power supply. The ITO thin film sputtering process can lower the voltage peak value of glow starting.

The invention discloses an ITO thin film sputtering process and an ITO thin film sputtering apparatus. The method comprises the following steps: before introducing process gas into a reaction chamber, controlling output voltage of a direct current sputtering power source to be predetermined voltage and applying predetermined power on a target material by using the direct current sputtering power source; introducing the process gas into the reaction chamber after predetermined time so as to allow the process gas to realize glow starting in the reaction chamber; and after glow starting, applying sputtering power on the target material by using the direct current sputtering power source to implement sputtering, wherein the sputtering power is more than or equal to the predetermined power but less than or equal to the rated power of the sputtering power source. The ITO thin film sputtering process provided by the invention can greatly reduce glow starting voltage, mitigates bombardment of a GaN layer caused by too high particle energy at the moment of glow starting and effectively reduces damage to the GaN layer. Moreover, since no new mechanism is needed, stability is improved, adjustment of the process can be conveniently carried out, and thin film deposition uniformity is enhanced.

The invention discloses a novel plasma display panel comprising a front substrate and a rear substrate in sealing connection with the front substrate, wherein the front substrate is provided with a discharge electrode comprising a sustaining electrode and a scanning electrode which are extended in parallel; and one of the sustaining electrode and the scanning electrode is a metal electrode, and the other one is a transparent electrode and a bus electrode located on the transparent electrode. The plasma display panel of the utility model is capable of achieving lower firing voltage and higher lighting effect on the substrate at the same time.

The invention discloses a preparation method of ultrapure magnesium oxide powder. The preparation method comprises the following steps of A. dissolving magnesium sulfate heptahydrate in pure water to prepare a magnesium sulfate solution and filtering to remove mechanical impurities and insoluble impurities; B. adding oxalic acid with continuously stirring, ageing repeatedly and carrying out suction filtration to remove calcium impurity; C. dropwise adding hydrogen peroxide into the solution with calcium removed with continuously stirring; D. adding a sodium hydroxide aqueous solution with continuously stirring; standing for stratification after reaction is completed, extracting a supernatant liquid, and removing impurities by a multi-stage precipitation and multi-stage filtration under a normal pressure; and E. putting the filtered clear liquid into a polytetrafluoroethylene reaction kettle, dropwise adding ammonium hydroxide with continuously stirring to obtain a pure magnesium hydroxide turbid liquid, separating a turbid liquid product through centrifugation, washing, filtering, drying, sintering for at least 5 h, and thus ultrapure magnesium oxide powder with a purity of 99.999% can be obtained.

A plasma display panel in which firing voltages between any of electrodes are low can be realized. A plasma display panel has a first substrate and a second substrate. The first substrate has a group of laterally extending first electrodes for performing sustain discharge and a group of laterally extending second electrodes which can be independently driven, a group of third electrodes positioned between the first and second electrodes, a dielectric layer covering-them, a group of fourth electrodes extending vertically and provided on the dielectric layer, and a protective layer. The second substrate has barrier ribs provided in parallel to the fourth electrodes so as to divide at least the first to third electrodes in the extending directions, and phosphors for emitting light when excited by an ultraviolet ray.

Process and device for reducing an ignition voltage of power pulses in plasmas operated in a pulsed manner with long pulse-off times. The process includes generating a power pulsed plasma at a pulse duty factor, the pulse duty factor being a ratio of pulse-on time to pulse-off time, and at least before the beginning of the pulse-on time of the power pulses, producing charge carriers using an additional plasma discharge at a lower power than that of the power pulses. The device includes a vacuum chamber including at least one pump system, an arrangement for producing plasma, the arrangement including at least one anode and at least one cathode, an energy source connected to the cathode and the anode which cab be pulsed in the frequency range of between approximately 10 Hz to approximately 1 MHz, and a mechanism for one of producing an additional plasma discharge.

The invention discloses an MgO/ ZnO composite medium protecting film and a preparation method thereof. The composite medium protecting film comprises an MgO film in which diffusely distributed ZnO particles are doped. According to the MgO/ ZnO composite medium protecting film, the ZnO particles are doped in the MgO film, so that the shapes of the surface particles are changed from elliptic shapes into triangular shapes; the secondary electron emission coefficients of the composite medium protecting film are increased, the firing voltage of a display can be effectively reduced, and therefore, the power consumption and cost of a PDP display can be certainly reduced, the service life of a device can be prolonged, and the stability of the working voltage of a display device can be improved.

The invention discloses a vacuum ultraviolet flat light source which comprises a front base plate and a rear base plate, wherein the front base plate is made of quartz glass, and a discharge cavity is arranged between the front base plate and the rear base plate; the front base plate is provided with paired parallel electrodes and adopts surface discharge, or the electrodes are arranged on the front base plate and the rear base plate, and an opposite type discharge mode is adopted; the surfaces of the electrodes are also provided with dielectric layers which are provided with protective films; the discharge cavity is filled with working gas with certain air pressure, and the working gas with certain air pressure can be formed by the mixed gas of Ne gas and Xe gas. When alternating-current pulses are brought between the electrodes, the working gas discharges, and 147nm and 172 nm vacuum-ultraviolet light is continuously generated under the action of keeping current pulses and sent to the outer surface of the vacuum ultraviolet flat light source, which needs to be processed, by the quartz base plates. The invention can generate a surface light source of the vacuum-ultraviolet light, thereby having superiority for processing surfaces with large areas; and the invention can generate single-surface and double-surface vacuum ultraviolet flat light sources, thereby being suitable for different application occasions.

The invention discloses a plasma display panel without a transparent electrode structure, which comprises an upper substrate and a lower substrate sealed with the upper substrate, wherein the upper substrate is provided with a first magnesium oxide layer positioned on the surface of upper substrate glass, a silver electrode X and a silver electrode Y which are positioned on the surface of the magnesium oxide layer, a dielectric layer positioned on the surfaces of the silver electrode X and the silver electrode Y, and a second magnesium oxide layer positioned on the surface of the dielectric layer. The invention also discloses two methods for manufacturing the plasma display panel without the transparent electrode structure, namely an electron beam evaporation method and a magnetron sputtering method. The manufacturing cost is reduced and the brightness is increased.

There is provided a substrate for a surface light source device, comprising a first secondary electron emission layer including crystalline magnesium oxide (MgO) powder on a surface of the substrate. There is also provided a surface light source device comprising a first substrate and a second substrate facing each other at a predetermined distance between which a discharge space is formed; and an electrode to apply a discharge voltage to the discharge space, wherein a first secondary electron emission layer including crystalline MgO powder is formed on a surface of at least one of the first substrate and the second substrate. Preferably, the crystalline MgO powder is obtained by grinding an MgO sputtering target. There is provided a backlight unit comprising a surface light source device including a discharge space formed between a first substrate and a second substrate, an electrode to apply a discharge voltage to the discharge space, and a first secondary electron emission layer including crystalline MgO powder on a surface of at least one of the first substrate and the second substrate; a case to receive the surface light source device; and an inverter to supply a discharge voltage to the electrode. Preferably, a second secondary electron emission layer ion-exchanged with a secondary electron emitting material is formed under a surface of the substrate.

Provided are a PDP device and a drive method thereof which restrict the generation of an erroneous discharge in the all-cell reset period and to restrict the appearance of flickers in the areas with low grayscale levels even if some areas have a lower firing voltage than the other areas due to variation of a property in the panel surfaces or due to a long-term driving, or even if the voltage applied to the address electrode is increased with the pursuit of high definition.

The pulse Pul.3 is applied to address electrodes Dat at timing t0 prior to timing t1 when the potential of the scan electrodes Scn is increased to Vq(V). In this drive method, voltage Vx(V) is applied to address electrodes Dat so that there is no potential difference between the scan electrodes Scn and the sustain electrodes Sus at timing t0 when discharge Dis.3 is generated. Accordingly, the discharge Dis.3, which is generated between the scan electrodes Scn and the sustain electrodes Sus due to reduction in the firing voltage, does not become a trigger for extending to the scan electrodes Scn to generate an erroneous discharge.