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Method for manufacturing rare earth aluminate substrate fluorescent powder

A manufacturing method and phosphor technology, applied in the direction of chemical instruments and methods, luminescent materials, etc., can solve the problems of process control, quality assurance, insufficient cost, difficult to apply to actual production, etc., to avoid sintering or adhesion, crystallinity is not affected Loss, effect of narrow distribution width

Active Publication Date: 2008-05-21
JIANGSU BREE OPTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In order to achieve this goal, people have successively carried out a large number of researches and attempts on wet chemical methods such as coprecipitation method, sol-gel method, spray pyrolysis and combustion method. , due to the shortcomings of these wet chemical methods in process control, quality assurance, cost and other aspects, it is still difficult to apply to actual production

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] 1) Raw material pretreatment

[0041] According to Ba 0.85 MgAl 10 O 17 :Eu 0.06 The chemical structural formula of , respectively weighs BaCO 3 13.98g, MgO 3.33g, Al 2 O 3 41.67g, Eu 2 O 3 0.88g. in 0.2M HNO 3 In the aqueous solution, adjust the pH value to 2, stir for 30 minutes, stand for 6 hours, centrifuge for dehydration, and then wash with distilled water (or deionized water) until the supernatant is neutral.

[0042] 2) Wet mixing

[0043] Weigh NH 4 0.9 g of F (0.5-10%) was dissolved in the phosphor powder raw material suspension that had been washed to neutrality, stirred for 50 minutes, left standing for 1 hour, and dried at 80°C.

[0044] 3) One high temperature air synthesis

[0045] Put it in a high temperature furnace under an air atmosphere, heat it to 1300 ° C, keep it for 6 hours, and cool it to room temperature with the furnace;

[0046] 4) One-time jet pulverization and classification

[0047] The fired powder is firstly added to the j...

Embodiment 2

[0055] Treat the raw materials according to the same stoichiometry and pretreatment process as in Example 1, take NH 4 F0.15g and BaF 2 0.28g, disperse and phosphor powder suspension, stir for 30min, let stand for 6h, dry at 100℃, put it in a high-temperature furnace, keep at 1500℃ for 4h, and cool down to room temperature with the furnace; add the sintered powder first Coarse crushing is carried out in a jaw crusher with corundum plate as the lining, and then the powder obtained by jaw crushing is added to a corundum roller crusher for further crushing to a powder state. Finally, the powder obtained by rolling is added to the jet mill and classifier to obtain a primary fired powder with a central particle size (D50) of ≤3.5 μm, D10≥1 μm, and D90≤7 μm. The primary synthetic powder obtained by classification is put into a crucible, placed in a high-temperature hydrogen furnace, kept at 1450 ° C for 6 hours, and cooled to room temperature with the furnace. The central particle...

Embodiment 3

[0058] Treat the raw materials according to the same stoichiometry and pretreatment process as in Example 1, take NH 4 F1.2g and H 3 BO 3 2.5g, dispersed in the phosphor powder suspension, stirred for 30min, left for 12h, dried at 100℃, placed in a high-temperature furnace, kept at 1550℃ for 3h, cooled to room temperature with the furnace, and released; add the fired powder first Coarse crushing is carried out in a jaw crusher with corundum plate as the lining, and then the powder obtained by jaw crushing is added to a corundum roller crusher for further crushing to a powder state. Finally, the powder obtained by rolling is added to the jet mill and classifier to obtain a primary fired powder with a central particle size (D50) of ≤3.5 μm, D10≥1 μm, and D90≤7 μm. The primary synthetic powder obtained by classification is put into a crucible, placed in a high-temperature hydrogen furnace, kept at 1400 ° C for 3 hours, and cooled to room temperature with the furnace. The centr...

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Abstract

The invention provides a production method of aluminate matrix phosphor, comprising seven steps as follows: pretreatment of raw materials, mixing of wet method, primary high-temperature air synthesis, primary smashing and grading, secondary high-temperature reduction, secondary grading and surface coating; finally the aluminate phosphor product with the surface coated with MgO film can be prepared. The method of the invention completely combines the advantages of wet chemical method, solid-phase reaction method, and modern air smashing and grading technology; the use of pretreatment of the raw materials for synthesis and the mixing process of wet method improves the reaction activity of the raw materials for synthesis; at the same time, the combination of the high-temperature solid-phase method and the air grading technology can achieve the effective control over the central grain size and distribution of the phosphor; finally the phosphor product of high luminous efficiency, fine grain size and centralized distribution can be prepared; the invention has significant application prospects.

Description

technical field [0001] The invention relates to a method for manufacturing an aluminate matrix phosphor, in particular to a method for manufacturing a phosphor for a plasma flat panel display (PDP) and a phosphor for a light-emitting diode, and belongs to the field of luminescent materials. Background technique [0002] A color plasma flat panel display (PDP) uses vacuum ultraviolet (VUV) generated by an inert mixed gas discharge to excite phosphors to achieve imaging purposes. The excitation wavelength range of phosphors for PDP is 100-200 nm, and the main excitation bands are around 147 nm and 172 nm. [0003] At present, the red, green and blue phosphors most commonly used in the field of PDP are composed of: red powder (Y 2 O 3 :Eu 3+ , (Y, Gd)BO 3 :Eu 3+ ), green powder (ZnSiO 4 :Mn 2+ , BaAl 12 O 19 :Mn 2+ ), blue powder (BaMgAl 10 O 17 : Eu 2+ ) These phosphors have been widely used in the field of plasma displays due to their good luminous efficiency and...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K11/64
Inventor 何锦华梁超蒋建清董岩邵起越张超
Owner JIANGSU BREE OPTRONICS CO LTD
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