Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Manufacture method of curved-surface sub-wavelength gratings based on PET

A sub-wavelength grating and manufacturing method technology, applied in the direction of diffraction grating, optics, optical components, etc., can solve the problems that the direct scribe method is difficult to achieve optical level accuracy, surface grating wrinkles, and affect the quality of the grating, so as to improve the production Efficiency, improvement of surface precision, effect of high surface precision

Inactive Publication Date: 2009-11-11
HEFEI UNIV OF TECH
View PDF4 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the application of the sensor requires that the grating pattern on the curved surface is relatively ideal and the roundness is relatively high, which brings unsolvable problems to the actual sensor production
Regarding the production of curved gratings, it is currently impossible to directly scribe gratings on curved surfaces in China, and it is difficult to achieve optical-level precision by direct scribe methods. It is easy to produce wrinkles and affect the quality of the grating

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] The manufacturing process of the PET-based curved subwavelength grating in this embodiment is as follows:

[0026] 1. Use the holographic lithography system to make sub-wavelength grating patterns on the UVIII glue layer on the surface of the silicon substrate to form a pattern transfer glue layer, use the pattern transfer glue layer as an etching mask, and use the ICP etching machine of STS company to perform reactive ionization Deep etch, transfer the sub-wavelength grating pattern to the silicon substrate, and then remove the pattern transfer adhesive layer to obtain the grating silicon template; in this step, SF can be used 6 、C 4 f 8 and O 2 The mixed gas is used as an etching gas to obtain a high vertical side wall with minimum roughness, and the volume ratio of the etching gas is SF 6 : C 4 f 8 :O2 is 35:85:10.

[0027] 2. Cut the PET sheet into the desired shape and clean it to obtain a PET substrate. The PET substrate and the grating silicon template are ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a manufacture method of curved-surface sub-wavelength gratings based on PET. The method is characterized in that PET is taken as grating material, and comprises the following steps: firstly, using microfabrication technology to prepare grating silicon stencils used for hot stamping, then heating the grating silicon stencils and PET substrate in vacuum, performing heat pressing, after a period of time, cooling and demoulding to finish manufacturing plane sub-wavelength gratings, and at last, bending the PET plane sub-wavelength grating stencils to be attached to the curved surface, so as to obtain curved-surface sub-wavelength gratings after solidification. The manufacture method of the invention has the advantages of flexible operation, low manufacturing cost, high grating efficiency and easy realization; curved-surface gratings manufactured on the basis of PET plane grating have high surface precision, good quality and clear stripe, and have the functions of two optical elements of plane grating and lens, so that light path can be greatly simplified.

Description

technical field [0001] The invention relates to a manufacturing method of a sub-wavelength grating, belonging to the technical field of grating manufacturing. Background technique [0002] Sub-wavelength gratings are gratings with a period shorter than the wavelength of light. They can be used as anti-reflection surfaces to prevent unwanted reflections in a wide range of spectra. Selecting appropriate materials and methods to efficiently manufacture high-quality, high-surface-precision gratings has important significance. [0003] At present, the relatively mature grating materials include polymethyl methacrylate PMMA and SU-8 glue. [0004] Polymethyl methacrylate PMMA has superior optical properties and is a highly transparent thermoplastic. It has good electrical properties and chemical corrosion resistance, and has certain applications in the production of gratings. However, the surface hardness of polymethyl methacrylate PMMA is not high, the impact resistance is low,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B5/18G02B1/04
Inventor 王旭迪卢景景金传山金建
Owner HEFEI UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com