Coating material and preparation method thereof
A technology for substrates and films, applied in chemical instruments and methods, metal material coating processes, sputtering plating, etc., can solve the problems of insufficient film hardness and poor adhesion between films and substrates.
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[0016] The present invention also provides a method for preparing a coating material. The method includes applying power to the magnetron target under sputtering conditions to sputter the target material on the magnetron target and deposit it on the substrate to form a solid surface on the substrate. Form a thin film on it, wherein the thin film includes a bottom layer, an intermediate layer and a first surface layer arranged in sequence, the target material forming the bottom layer contains stainless steel, and the magnetron target forming the intermediate layer includes a stainless steel target and a chromium target; forming the first surface layer The magnetron target of the layer includes a stainless steel target and a chromium target; when forming the bottom layer and forming the middle layer, it is carried out under an argon atmosphere, and when forming the first surface layer, it is carried out under an argon and nitrogen and / or gaseous hydrocarbon atmosphere .
[0017]...
Embodiment 1
[0034] This embodiment is used to illustrate the coating material provided by the present invention and its preparation method.
[0035] Using magnetron sputtering plating equipment (magnetron sputtering coating machine, manufactured by Beijing Shiliyuan Technology Co., Ltd., model SP1512), the magnetron sputtering ion plating equipment includes a vacuum chamber, a heating device, a workpiece frame, and a magnetron target and biasing device, heating device, workpiece holder and magnetron target are located in the vacuum chamber. The magnetron target is a target structure, including a pair of stainless steel targets and a pair of chromium targets. The distance between the two targets of a pair of stainless steel targets is 18 cm, and the two targets are connected to the positive and negative electrodes of a power supply with a frequency of 40 kHz; the distance between the two targets of the chromium target is 18 cm, and the two The target is connected to the positive and negat...
Embodiment 2
[0043] This embodiment is used to illustrate the coating material provided by the present invention and its preparation method.
[0044] Magnetron sputtering ion plating equipment (magnetron sputtering ion coating machine, manufactured by Beijing Shiliyuan Technology Co., Ltd., model SP1512), the magnetron sputtering ion plating equipment includes a vacuum chamber, a heating device, a workpiece frame, a magnetic The target and bias device, the heating device, the workpiece holder and the magnetron target are located in the vacuum chamber. The magnetron target is a target structure, including a pair of stainless steel targets and a pair of chromium targets. The distance between the two targets of a pair of stainless steel targets is 18 cm, and the two targets are connected to the positive and negative electrodes of a power supply with a frequency of 40 kHz; the distance between the two targets of the chromium target is 18 cm, and the two The target is connected to the positive...
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Abstract
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