Method for preparing hollow mesoporous lamella spherical silica material

A technology of spherical silicon oxide and empty mesopores, applied in the direction of silicon oxide, silicon dioxide, etc.

Inactive Publication Date: 2010-03-31
DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, under alkaline conditions, the preparation of hollow silica materials with an ordered

Method used

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  • Method for preparing hollow mesoporous lamella spherical silica material
  • Method for preparing hollow mesoporous lamella spherical silica material
  • Method for preparing hollow mesoporous lamella spherical silica material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] At room temperature, add 2g PS spheres into a mixed solution of 30mL ethanol and 25g water, ultrasonically disperse for 15min, add 0.625g CTAB, stir for 30min, add ammonia water (28wt%) 3mL, continue stirring for 5min, add 2mL TEOS, stir at room temperature React for 2 hours, centrifuge to obtain a white powder, wash with water and ethanol three times, and dry in a 50°C oven for 24 hours. The dried sample is raised from room temperature to 550°C at a rate of 1°C / min in a muffle furnace and kept for 5 hours to obtain a hollow Silica balls. The specific surface area of ​​the obtained material is 1099m 2 / g, the average pore diameter is 2.34nm, and the pore volume is 0.63mL / g.

Embodiment 2

[0031] At 60°C, add 4g PS spheres into a mixed solution of 30mL ethanol and 25g water, ultrasonically disperse for 15min, add 0.625gCTAB, stir for 30min, add 12mL ammonia water (28wt%), continue stirring for 5min, add 2mL TEOS, and stir the reaction After 24 hours, centrifuge to obtain a white powder. After washing three times with water and ethanol, dry it in a 50°C oven for 24 hours. The dried sample is raised from room temperature to 550°C at a rate of 1°C / min in a muffle furnace and kept for 5 hours to obtain a hollow oxidized Silicon spheres.

Embodiment 3

[0033] At room temperature, add 2g PS spheres into a mixed solution of 80mL ethanol and 25g water, ultrasonically disperse for 15min, add 2.5g CTAB, stir for 30min, add ammonia water (28wt%) 3mL, continue stirring for 5min, add 1mL TEOS, stir at room temperature React for 2 hours, centrifuge to obtain a white powder, wash with water and ethanol three times, and dry in a 50°C oven for 24 hours. The dried sample is raised from room temperature to 550°C at a rate of 1°C / min in a muffle furnace and kept for 5 hours to obtain a hollow Silica balls.

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Abstract

The invention relates to an inorganic porous material synthesis technology field, and concretely relates to a method for preparing hollow mesoporous lamella spherical silica material. In a mixed solvent of alcohol and water, under the catalytic action of ammonia, using a cationic surface active agent of cetyl trimethyl ammonium bromide as a mesoporous template, the inorganic silicon material self-assembles to be mesoporous uniform spheres on the polyphenylacetylene sphere surface, the surface active agent and the polyphenylacetylene sphere are deprived in high temperature environment, the hollow silica spheres with uniform size from micron to millimeter and mesoporous lamella are obtained. The specific surface area of the obtained hollow silica sphere is 800-2000m<2>/g, the bore diameter is 1.8-3.5nm, and the bore volume is 0.5-0.8 ml/g.

Description

technical field [0001] The invention relates to a hollow mesoporous shell spherical silicon oxide material, in particular to a method for preparing a hollow mesoporous shell spherical silicon oxide material. Background technique [0002] In 1992, Mobil Corporation first reported the M41S series mesoporous materials with high specific surface area and high degree of order (U.S. Patent 5057296; U.S. Patent 5098684; Nature, 1992, 359: 710), the synthesis of mesoporous materials with different shapes and their Applications in catalysis, separation, sensors, microelectrodes, and semiconductor materials have received widespread attention. Generally, the structure and morphology of materials have an important impact on its application. Hollow spherical materials with a single pore size distribution in the shell can not only greatly increase the loading capacity of guest molecules, but also facilitate the internal and external transport of guest molecules. At the same time, due to t...

Claims

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Application Information

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IPC IPC(8): C01B33/18
Inventor 张世刚刘中民许磊刘红超
Owner DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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