Preparing method of PZT thin films
A film and sol technology, applied in the field of PZT film preparation, can solve the problems of film unevenness, affecting the electrical properties of PZT film, particle aggregation, etc.
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[0006] The invention provides a kind of preparation method of PZT film, at first prepare used precursor solution, lead acetate, butyl titanate and zirconyl heptanoate are dissolved in ethylene glycol ethyl ether, wherein the concentration ratio of the four is 1.15: 0.5:0.5:4, then add a small amount of glacial acetic acid to catalyze the hydrolysis rate of the sol to obtain the PZT sol, and then use a homogenizer to spin the PZT sol on the silicon wafer for multiple times to form a film. The method is as follows: Spin the film on the glue leveling machine in a clean environment, firstly level the glue at a speed of 300r / min for 5s, so that the dropped PZT sol can evenly cover the entire surface of the silicon wafer before high-speed rotation, so that after high-speed spin coating The thin film has better uniformity, and then, spin the glue at a speed of 3000r / min for 20s, and use an iodine tungsten lamp to irradiate each time the glue is spin-coated. During the irradiation proc...
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