Method for machining nanometer channel on microfluid chip
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[0029] The present invention will be further described below in conjunction with the accompanying drawings. Such as Figure 1-2 As shown, a method for processing nanochannels on a microfluidic chip comprises the following steps:
[0030] A. Using lithography, that is, by printing a channel as a micron-scale mask, using SU-8 negative photoresist, and processing a main channel 1 and a mixed solution injection channel 2 on a silicon-based wafer by ultraviolet exposure Then cast polydimethylsiloxane (PDMS) on the wafer, and use a constant temperature vacuum furnace to cure for 3 to 4 hours at 70-80°C; peel off the PDMS from the wafer, and in the main channel 1 A buffer solution storage hole 3 is drilled at both ends of the buffer solution, and a mixed solution storage hole 4 is punched at the top of the mixed solution injection channel 2; the PDMS6 with the concave channel and the glass negative film 5 are sealed by air plasma. connected to form a chip with micron-scale channels...
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