Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Copolymer

A technology of copolymers and monomer units, applied in the field of copolymers, can solve the problems of insufficient chemical resistance and alkali resistance of cured coating films, and achieve good curability and storage stability, high adhesion, and drug resistance. good quality effect

Active Publication Date: 2010-07-21
DAICEL CHEM IND LTD
View PDF1 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the cured coating film obtained from this curable composition has insufficient chemical resistance, especially alkali resistance.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Copolymer
  • Copolymer
  • Copolymer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

Embodiment 2

Embodiment 3

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
dispersityaaaaaaaaaa
Login to View More

Abstract

Disclosed is a copolymer containing at least a monomer unit derived from a vinyl monomer A having a blocked isocyanate group represented by the formula (1) below and a monomer unit derived from a vinyl monomer B having a 3- to 5-membered cyclic ether group. This copolymer may further contain a monomer unit derived from an alkyl (meth)acrylate ester, an aromatic vinyl compound, a hydroxyl group-containing monomer or a carboxyl group-containing monomer. In the formula (1) below, R1 represents a hydrogen atom or a methyl group; R2 represents a divalent aliphatic saturated hydrocarbon group having 1-8 carbon atoms; and R3 represents a residue of a blocking agent R3H of an isocyanate group. This copolymer enables to obtain a cured product which is excellent in chemical resistance, especially in alkali resistance, while exhibiting excellent adhesion to a base.

Description

technical field The present invention relates to copolymers having blocked isocyanate groups and cyclic ether groups. The copolymer of the present invention can be used in paints, coating agents, adhesives, electronic material applications (protective films, sealing materials, etc.), and the like. Background technique Conventionally, as a composition capable of forming a cured coating film by curing with heat or light, curable resin compositions containing a polymer having an epoxy group on a side chain, and a polymer having an isocyanate group on a side chain are known. curable resin composition, a curable resin composition obtained by adding an acid, a base, an organometallic catalyst, etc. to a polymer containing an alkoxysilyl group, and the like. However, cured coating films obtained from these curable resin compositions cannot fully satisfy all required properties such as curability, adhesion to substrates, chemical resistance, and storage stability. Japanese Patent...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C08F220/36
CPCC08F220/36C08F220/32C09D133/14C08F2220/325C09J133/14C08F220/325C08F220/365
Inventor 二十轩年彦中川泰伸
Owner DAICEL CHEM IND LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com