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35 results about "Aliphatic saturated hydrocarbon" patented technology

An aliphatic compound is a hydrocarbon compound containing carbon and hydrogen joined together in straight chains, branched trains or non-aromatic rings. Aliphatic compounds may be saturated (e.g., hexane and other alkanes) or unsaturated (e.g., hexene and other alkenes, as well as alkynes).

Lithium Secondary Battery

In order to provide a lithium secondary battery having high terminal-to-terminal open circuit voltage at the end of charge, suppressed amount of evolved gas on continuous charge, and superior cycle characteristics, the electrolyte solution thereof comprises either both vinylethylene carbonate compound and vinylene carbonate compound, lactone compound having a substituent at its a position in an amount of 0.01 weight % or more and 5 weight % or less, lactones having an unsaturated carbon-carbon bond in an amount of 0.01 weight % or more and 5 weight % or less, or sulfonate compound represented by the formula below.In the formula, L represents a bivalent connecting group consisting of at least one carbon atom and hydrogen atoms, and R30 represents, independently of each other, an unsubstituted or fluorine-substituted aliphatic saturated hydrocarbon group.
Owner:MITSUBISHI CHEM CORP

Vibration damping rubber composition

InactiveUS20060217493A1Good vibration reduction effectCross-linking reactivity can be improvedVulcanizationHydrogen atom
A vibration damping rubber composition having an excellent vibration damping performance includes the following (A) to (C) as essential components: (A) a diene-based rubber; (B) a vulcanizing agent of a bismaleimide compound represented by the following formula (1): [wherein X denotes a substituted or unsubstituted aliphatic saturated hydrocarbon group; and R1 to R4 may be the same or different and each denote a hydrogen atom, an alkyl group, —NH2, or —NO2, provided that the bismaleimide compound represented by formula (1) excludes a compound in which X is —(CH2)n- (n is an integer of 4 to 12) and all R1 to R4 are hydrogen atoms], wherein the vulcanizing agent is sulfur-free; and (C) a vulcanization accelerator.
Owner:SUMITOMO RIKO CO LTD

Copolymer

Disclosed is a copolymer containing at least a monomer unit derived from a vinyl monomer A having a blocked isocyanate group represented by the formula (1) below and a monomer unit derived from a vinyl monomer B having a 3- to 5-membered cyclic ether group. This copolymer may further contain a monomer unit derived from an alkyl (meth)acrylate ester, an aromatic vinyl compound, a hydroxyl group-containing monomer or a carboxyl group-containing monomer. In the formula (1) below, R1 represents a hydrogen atom or a methyl group; R2 represents a divalent aliphatic saturated hydrocarbon group having 1-8 carbon atoms; and R3 represents a residue of a blocking agent R3H of an isocyanate group. This copolymer enables to obtain a cured product which is excellent in chemical resistance, especially in alkali resistance, while exhibiting excellent adhesion to a base.
Owner:DAICEL CHEM IND LTD

Photosensitive resin composition, photospacer, protective film for color filters, and protective film or insulating film of touch panel

The objective of the present invention is to provide a photosensitive resin composition which has high developability and provides a cured product that has excellent elastic modulus recovery characteristics and adhesion, and which enables the formation of a highly fine spacer. A photosensitive resin composition according to the present invention is characterized by containing (A) a hydrophilic resin, (B) a polyfunctional (meth)acrylate, (C) a photopolymerization initiator, (D) a solvent having an HLB of from 8.0 to 30.0 (inclusive) and (E) a compound which is a condensation product that has a compound represented by general formula (1) as an essential constituent monomer. (In formula (1), R1 represents one or more organic groups which are selected from the group consisting of a (meth)acryloyloxyalkyl group, a glycidoxyalkyl group, a mercaptoalkyl group and an aminoalkyl group, in each of which an alkyl group having 1-6 carbon atoms; R2 represents an aliphatic saturated hydrocarbon group having 1-12 carbon atoms or an aromatic hydrocarbon group having 6-12 carbon atoms; R3 represents an alkyl group having 1-4 carbon atoms; M represents one or more atoms selected from the group consisting of a silicon atom, a titanium atom and a zirconium atom; and m represents 0 or 1.)
Owner:SANYO CHEM IND LTD

Fluorosilicone rubber composition and molded rubber article

A fluorosilicone rubber composition is provided comprising (A) a first organopolysiloxane having the formula: R1aR2bR3cSiO(4-a-b-c) / 2 wherein R1 is trifluoropropyl, R2 is an aliphatic unsaturated hydrocarbon group, R3 is an aliphatic saturated hydrocarbon or aromatic hydrocarbon group, (B) a silica filler, (C) a second organopolysiloxane having formula (2) wherein R4 is an aliphatic unsaturated hydrocarbon group or the like, and (D) a cure catalyst. The fluorosilicone rubber composition affords satisfactory adhesion at the interface with dimethylsilicone rubber even when the molding pressure is low.
Owner:SHIN ETSU CHEM IND CO LTD

Electrolyte Additive for Rechargeable Lithium Battery and Rechargeable Lithium Battery Including Same

An electrolyte additive for a rechargeable lithium battery, represented by the following Chemical Formula 1:wherein, R1 to R4 are each independently selected from hydrogen, an aliphatic saturated hydrocarbon group, an aliphatic unsaturated hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, or a combination thereof, provided that at least one of R1 or R2 and at least one of R3 or R4 are independently an unsaturated hydrocarbon group including at least one carbon-carbon double bond, and R5 is selected from hydrogen, a halogen, an aliphatic saturated or unsaturated hydrocarbon group, an aromatic hydrocarbon group, a hydroxyl group, a nitro group, a cyano group, an imino group, an amino group, an amidino group, a hydrazine group, a carboxyl group, a heterocyclic group, or a combination thereof.
Owner:SAMSUNG SDI CO LTD

Filter For Water Treatment Filtering and Method For Producing The Same

The problem to be solved by the present invention is to provide a filter medium for a water treatment filter having contradictory characteristics, that is, hydrophilicity and chemical resistance, and a long life, and to provide the production method thereof. A filter medium for a water treatment filter according to the present invention is characterized in comprising a porous base material having a hydrophilic coating layer; wherein the hydrophilic coating layer has a cross-linked hydrophilic polymer and a high electron density part; a hydrophilic polymer in the cross-linked hydrophilic polymer is cross-linked with an aliphatic saturated hydrocarbon group which may contain one or more functional groups selected from a group consisting of an ether group, a hydroxy group and an amino group; the high electron density part has π electrons; and the high electron density part is covalently bonded to the cross-linked hydrophilic polymer.
Owner:W L GORE & ASSOC GK

Selective Inhibitors Against Cdk4 and Cdk6 Having Aminothiazole Skeleton

The present invention relates to a compound represented by Formula [I]: wherein X is O, S, NH or CH2; Y1, Y2, Y3, Y4 and Y5, which may be identical or different, are each CH or N; however, at least one of Y1, Y2, Y3, Y4 and Y5 is N; Z1 and Z2, which may be identical or different, are each CH or N; n is an integer from 1 to 3; R1 is a C3-C8 cycloalkyl group, a C6-C10 aryl group, an aliphatic heterocyclic ring or an aromatic heterocyclic ring, or a bicyclic aliphatic saturated hydrocarbon group; R2 and R3, which may be identical or different, are each a hydrogen atom, a lower alkyl group, a lower alkenyl group, a C3-C8 cycloalkyl group, a C6-C10 aryl group, an aromatic heterocyclic ring, or the like; and R4 is a hydrogen atom, a lower alkyl group, a C3-C6 cycloalkyl group or the like, or a pharmaceutically acceptable salt or ester thereof, and a selective inhibitor against Cdk4 and / or Cdk6 or an anticancer agent containing the compound or a pharmaceutically acceptable salt or ester thereof.
Owner:MSD KK

Process for producing 4, 4'-bisphenol sulfone

A process for producing 4,4'-bisphenol sulfone by reacting phenol with sulfuric acid, which comprises conducting the dehydration reaction in a mixed solvent comprising mesitylene and an aliphatic saturated hydrocarbon having a boiling point of 175 DEG C or higher and finally distilling off the mesitylene from the reaction system, or comprises conducting the reaction in a solvent comprising an aliphatic saturated hydrocarbon in a reaction vessel equipped with a fractionating device. Thus, 4,4'-bisphenol sulfone can be produced in high yield with a higher operating efficiency. Also provided is a process for easily producing 4,4'-bisphenol sulfone having a high purity which comprises conducting the reaction in a solvent containing an aliphatic saturated hydrocarbon, subsequently adding a C1-3 alcohol to the reaction mixture, separating the alcohol layer from the resultant mixture, and recrystallizing the 4,4'-bisphenol sulfone from the alcohol layer.
Owner:NIPPON SODA CO LTD

Process for producing 4,4'-bisphenol sulphone

During reaction of phenol and sulfuric acid to produce 4, 4í»-bisphenol sulfone, the reaction system is dewatered in mixed solvent comprising saturated aliphatic hydrocarbon of boiling point not lower than 175 deg.c and mesitylene, and the reaction system is ultimately distilled to eliminate mesitylene. Or, the reaction is completed in solvent containing saturated aliphatic hydrocarbon inside a reaction container with rectifier, so as to obtain excellent operation performance and high yield of 4, 4í»-bisphenol sulfone. In addition, after reaction in solvent containing saturated aliphatic hydrocarbon, C1-C3 alcohol is added into the reacted solution, so that 4, 4í»-bisphenol sulfone is re-crystallized in separated alcohol layer and high purity 4, 4í»-bisphenol sulfone product is obtained simply.
Owner:NIPPON SODA CO LTD

Gasket rubber product

A gasket rubber product made of a cured material of a fluorosilicone rubber composition containing: 100 parts by weight of an organopolysiloxane expressed by the following average composition formula: R1aR2bR3cSiO(4−a−b−c) / 2 wherein R1 indicates a trifluoropropyl group, R2 indicates a non-substituted or substituted monovalent aliphatic unsaturated hydrocarbon group having 2 to 8 carbon atoms, R3 indicates a non-substituted monovalent aliphatic saturated hydrocarbon group or aromatic hydrocarbon group having 1 to 8 carbon atoms, provided that a, b and c are positive numbers satisfying 0.96≦a≦1.01, 0.002≦b≦0.02, 0.96≦c≦1.06 and 1.98≦a+b+c≦2.02; 5 to 100 parts by weight of a silica-based filler; and a catalyst quantity of a curing catalyst.
Owner:OKAMOTO MASARU +1

Fluorine-containing copolymer

The present invention is a fluorine-containing copolymer including (A) a fluoroolefin in an amount of 15 to 85 mol % of all constituent monomers; (B) a specific organosilicon compound in an amount of 0.001 to 10 mol % of all the constituent monomers; (C) one or more monomers selected from vinyl ethers, vinyl esters, methacrylic esters and acrylic esters, the one or more monomers not having a curing reactive group and having an aliphatic saturated hydrocarbon group with 1 to 20 carbons, a glass transition temperature of a homopolymer of the monomer being lower than 0° C., in an amount of 5 to 40 mol % of all the constituent monomers; and (D) one or more monomers selected from vinyl ethers, vinyl esters, allyl ethers, methacrylic esters and acrylic esters, and having a curing reactive group, in an amount of 1 to 25 mol % of all the constituent monomers, wherein the fluorine-containing copolymer has a glass transition temperature of −30° C. to 20° C., a number average molecular weight of 2.0×104 to 7.0×104, and a weight average molecular weight of 1.0×105 to 3.0×105.
Owner:KANTO DENKA IND CO LTD

Azo compound or salts thereof

The present invention provides novel azocompound which represents high color concentration and is represented by a formula (I) or a salt thereof. In the formula (I), A represents a phenyl group which is provided with at least one group selected from carboxy group, sulfo group, sulfamoyl and N-substituted sulfamoyl, or a naphthyl group which is provided with at least one group selected from sulfo group, sulfamoyl and N-substituted sulfamoyl. R<1> and R<2> represent hydrogen atom or aliphatic saturated hydrocarbon group. R<3> and R<4> are independent respectively, and represent hydrogen atom, aliphatic saturated hydrocarbon group, aryl, aralkyl or acyl.
Owner:SUMITOMO CHEM CO LTD

Azo compound or salts thereof

The present invention provides a novel azocompound which represents high color concentration and is represented by a formula (I) or a salt thereof. In the formula (I), Z<1> and Z<2> are independent respectively, represent oxygen atom or sulfur atom. R<1> to R<4> are independent respectively, represent oxygen atom, aliphatic saturated hydrocarbon group, alkoxy, aryl or aralkyl. R<5> to R<12> are independent respectively, and represent hydrogen atom, halogen atom, aliphatic saturated hydrocarbon group, alkoxy, carboxy group, sulfo group, sulfamoyl or N-substituted sulfamoyl.
Owner:SUMITOMO CHEM CO LTD

Azo compound or salts thereof

The present invention provides a novel azocompound which represents high color concentration and is represented by a formula (I) or a salt thereof. In the formula (I), Z represents O or S. A represents a phenyl group which is provided with at least one group selected from carboxy group, sulfo group, sulfamoyl and N-substituted sulfamoyl, or a naphthyl group which is provided with at least one group selected from sulfo group, sulfamoyl and N-substituted sulfamoyl. R<1> and R<2> are independent respectively, and represent hydrogen atom, aliphatic saturated group, alkoxy, aryl, aralkyl or acyl. R<3> to R<6> are independent respectively, and represent hydrogen atom, halogen atom, aliphatic saturated hydrocarbon, alkoxy, carboxyl group, sulfo group, sulfamoyl or N-substituted sulfamoyl.
Owner:SUMITOMO CHEM CO LTD

Salt, photoresist composition and method for producing photoresist pattern

The invention provides a salt, photoresist composition and a method for producing photoresist pattern.A photoresist composition which comprises a salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1, R2 and R3 each independently represent a hydrogen atom or a C1-C10 monovalent aliphatic saturated hydrocarbon group, X1 and X2 each independently represent a single bond, a carbonyl group, or a C1-C10 divalent aliphatic saturated hydrocarbon group where a hydrogen atom can be replaced by a hydroxy group and where a methylene group can be replaced by an oxygen atom, a sulfonyl group or a carbonyl group, A1 represents a C1-C30 organic group, m1 represents an integer of 1 to 4, and Z+ represents an organic cation, and a resin which is hardly soluble or insoluble but soluble in an aqueous alkali solution by action of an acid.
Owner:SUMITOMO CHEM CO LTD
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