Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for modifying nano silicon dioxide for ink sucking coating

A nano-silica, ink-absorbing coating technology, applied in chemical instruments and methods, coatings, paper coatings, etc., can solve the problems of low ink-absorbing efficiency, poor hydrophilicity of nano-silica, and achieve ink-absorbing efficiency. The effect of improving, good physical tensile properties and no pollution to the environment

Active Publication Date: 2012-09-05
HARBIN INST OF TECH
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a modification method of nano-silica for ink-absorbing coatings in order to solve the problems of poor hydrophilicity and low ink-absorbing efficiency of existing ink-absorbing coatings.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for modifying nano silicon dioxide for ink sucking coating
  • Method for modifying nano silicon dioxide for ink sucking coating
  • Method for modifying nano silicon dioxide for ink sucking coating

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0007] Specific embodiment one: In this embodiment, a method for modifying nano-silica for ink-absorbing coatings is carried out according to the following steps: 1. Take rare earth or rare earth mixture, make it fully dissolved in water, filter, constant volume, and prepare To obtain a rare earth solution with a mass concentration of 1% to 50%; 2. Mix the rare earth solution with nano-silicon dioxide, add 0.02g of nano-silicon dioxide to each milliliter of rare earth solution, and carry out the mixture under the condition of a constant temperature water bath at 25-120°C Modify, and keep stirring; 3. After the modification time is reached, stop the modification, centrifuge, pour out the supernatant, and the obtained precipitate is the modified nano-silica.

specific Embodiment approach 2

[0008] Embodiment 2: This embodiment differs from Embodiment 1 in that: in step 1, a rare earth solution with a mass concentration of 15% to 35% is prepared. Others are the same as in the first embodiment.

specific Embodiment approach 3

[0009] Embodiment 3: This embodiment differs from Embodiment 1 or Embodiment 2 in that: in step 1, a rare earth solution with a mass concentration of 25% is prepared. Others are the same as in the first or second embodiment.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
particle diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to a method for modifying nano silicon dioxide, in particular to a method for modifying nano silicon dioxide for an ink sucking coating. The invention solves the problems of poor hydrophilism and low ink sucking efficiency of the traditional nano silicon dioxide for an ink sucking coating. The method comprises the following steps of: 1. weighing rare earth or rare earth mixture, dissolving, filtering and keeping the volume constant to prepare a rare earth solution; 2. mixing the rare earth solution with nano silicon dioxide, modifying under the condition of thermostatic water bath and stirring; and 3. after reaching modified time, stopping, centrifuging and pouring supernatant to obtain the modified nano silicon dioxide. The modified nano silicon dioxide prepared by the invention has strengthened hydrophilism and high ink sucking efficiency and can be applied to the fields of ink jet printing, reinforcing agents of modified plastics for reducing the weight of automobiles, scratching resistant coating materials on automobile surfaces, and the like.

Description

technical field [0001] The invention relates to a method for modifying nano silicon dioxide. Background technique [0002] As a member of the nano family, nano-silicon dioxide is a nano-material with the highest output in large-scale industrial production in the world due to its low production cost. Nano-silica is a fine chemical product, which plays an important role in the construction industry, cosmetics, chemical industry, medicine, special materials, and special products in the aerospace industry. [0003] Nano-silica is also widely used in color inkjet printing. Coated paper for inkjet printing is to coat a layer of materials or pigments with ink-absorbing porous structure on the surface of base paper for inkjet printing. The advantages of nano-silica such as low cost, large specific surface area, and microporosity make it widely used in the preparation of ink-absorbing layers. However, high-performance ink-absorbing coatings require a good combination of nano-silic...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C09C1/28C09C3/06D21H19/00
Inventor 邵路白永平
Owner HARBIN INST OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com