Cleaning system and cleaning method of developing solution circulation process equipment

Abstract

The invention discloses a cleaning system and a cleaning method of developing solution circulation process equipment. The cleaning system of the developing solution circulation process equipment comprises a developing tank, a concentration tank, a circulation power pump and a microfiltration film pipe fitting adopting cross filtration, wherein the developing tank is connected to the concentrationtank; the concentration tank is connected to the circulation power pump; the circulation power pump is connected to one end of the microfiltration film pipe fitting through the water outlet pipeline of the pump; the other end of the microfiltration film pipe fitting is connected to the concentration tank through a strong water return pipeline; and the microfiltration film pipe fitting is connected to the developing tank through a filter liquor return pipeline. Particularly, a back washing device, a medicine washing device and a water washing device are fully designed in the cleaning system for the cleaning of the microfiltration film pipe fitting, so as to prevent a microfiltration film from being blocked and maintain the optimum filtration function of the microfiltration film pipe fitting; and meanwhile, a film pipe protecting device is further arranged in the cleaning system, whether the microfiltration film pipe fitting needs cleaning is judged by a controller, and the corresponding cleaning mode is selected through the controller, so as to control the start-up of different cleaning devices.

Description

technical field [0001] The invention relates to the technology in the field of sewage treatment, in particular to a cleaning system and a cleaning method for developer circulation treatment equipment. Background technique [0002] The developing waste liquid belongs to the photosensitive material waste, and has been included in the "National Hazardous Waste List" as a hazardous waste numbered HW16. Since the waste developer solution contains chemical substances such as sulfuric acid, nitric acid, benzene, methanol, boric acid, hydroquinone, tetraalkylammonium hydroxide (hereinafter referred to as TAAH), and dissolved photoresist, these Chemical substances are very harmful to the environment and human beings, so the recycling of developing waste liquid is an important measure to protect the environment and save development costs. But the photoresist that dissolved is difficult for removing, and it is dissolved in the developing solution and directly influences the recycling ...

AI Technical Summary

Problems solved by technology

[0004] For example, in the Chinese invention patent "Biological Treatment Method of Waste Developer and Waste Fixer" with the patent number of 200510028668.8, biological methods are used to treat waste developer. The cultivation process is complicated, and this method is only used to treat the developer, and does not involve recycling, so it is not suitable for general use;

[0005] For another example, the Chinese invention patent "Method of Treatment of Developing Waste Liquid" with the patent number of 200580047345.1 has very high requirements on the processing of developing liquid, and requires that the content of a metal impurity in the waste liquid is relatively higher than that of tetraalkyl Ammonium is not higher than 50ppm, and the content of each metal ion is required to be not higher than 120ppm relative to tetraalkylammonium. If it is higher than that, it needs to be diluted with very pure tetraalkylammonium, so that the invention has great limitations;

[0006] For another example, in the Chinese invention patent "Developing Device, Developing Method and Developer Solution Circulation Method" with the patent number of 200480002989.4, it uses an ultrafiltration filtration system to divide the developer solution into a filtrate and a concentrated solution. This equipment can effectively remove the photoresist. agent, and recycle the developing solution, and the developing process is carried out simultaneously with the developing waste liquid treatment process, which is suitable for the process management of the factory, but the ultrafiltration membrane used in the invention is easy to block and difficult to clean, has a short service life, and is susceptible to microorganisms such as bacteria Moreover, when there is a sudden power failure or negative pressure on the concentrated water side or the filtrate side of the membrane tube, the equipment does not have effective means or technology to protect its ultrafiltration membrane, resulting in its ultrafiltration The membrane is damaged, and in this technology, the cleaning device and method for the filter membrane are relatively simple, and there is a phenomenon of incomplete cleaning, which leads to the aforementioned ultrafiltration membrane being easily blocked and affecting its use and life. and high maintenance costs

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