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Photoresist stripping liquid composition

A technology of stripping liquid and composition, which is applied in the direction of photosensitive material processing, etc., can solve the problems of pollution, photoresist residual penetration, etc., and achieve the effect of solving the problem of residual or penetration pollution, improving solubility and stripping property

Active Publication Date: 2013-02-20
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The invention provides a photoresist stripping liquid composition to improve the solubility and stripping properties of photoresist, and solve the problem of photoresist residue or penetration pollution

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0028] As an example, put the components of Example 1 to Example 8 in Table 1 into a container, and mix them uniformly by means of stirring, shaking, etc., to prepare a photoresist stripping liquid composition.

[0029] As a comparative example, put the components of Comparative Example 1 to Comparative Example 7 in Table 1 into a container, and mix them uniformly by means of stirring, shaking, etc., to prepare a photoresist stripping liquid composition.

[0030] Table I

[0031]

[0032] Specific evaluation and results

[0033] The resist stripping liquid compositions of the above Examples and Comparative Examples were evaluated for solubility and stripping properties in the following manner.

[0034] First, the solubility evaluation of the photoresist is carried out, and the substrate coated with a photoresist with a thickness of 1.8 μm is soaked in the above-mentioned photoresist stripping solution composition solution, or using the above-mentioned photoresist st...

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PUM

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Abstract

The invention provides a photoresist stripping liquid composite, wherein the photoresist stripping liquid composite is composed of an organic silicon compound, an acrylate copolymer and an organic solvent. When acting as a surface active agent, the photoresist stripping liquid composite provided by the invention is added with the organic silicon compound; and when acting as a stress equilibrium agent, the photoresist stripping liquid composite is added with the acrylate copolymer, therefore the dissolubility and the stripping property of the photoresist are improved; and the residual or penetration pollution problem of the photoresist is solved.

Description

technical field [0001] The invention relates to a photoresist removal technology, in particular to a photoresist stripping liquid composition. Background technique [0002] In the manufacturing process of liquid crystal display devices and semiconductor elements, photolithography is usually used to form required patterns. [0003] Taking the manufacture of color filters for liquid crystal display devices as an example, the process of using photoresist for etching mainly includes: using spin coating (spin coating), slit coating (slit coating) or slit and spin coating ( slit&spin coating) and other methods, uniformly coating a layer of photoresist on the glass substrate; drying the coated photoresist; using a mask to expose the above substrate; developing the exposed substrate with a developer, The photoresist in the unphotosensitive part is removed through the development process to obtain the desired pattern; it is baked in an oven to completely evaporate the solvent in the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/42
Inventor 杨久霞赵吉生
Owner BOE TECH GRP CO LTD
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