Stripping liquid composition of photoresist
A photoresist and stripping solution technology, applied in the direction of photosensitive material processing, etc., can solve the problems of inability to remove the photoresist film cleanly, the corrosion of the substrate is aggravated, etc., to achieve excellent stripping effect, low water requirements, The effect of cost minimization
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[0035] The photoresist stripper composition of the present invention is a composition containing an inorganic base, an organic base, a water-soluble organic solvent, an anticorrosive agent, and water.
[0036] The inorganic base in the present invention includes one or two of sodium hydroxide, potassium hydroxide, and lithium hydroxide. The content of the inorganic base is 0.1wt%-35wt%., preferably 0.5-20wt%, more preferably 1-10wt%. When the concentration is less than 0.1wt%, it will not have the effect of synergistically attacking the photoresist film; At 35wt%, the corrosion of the substrate will increase.
[0037] The organic base described in the present invention includes at least one of alkanolamine and quaternary amine base. As a specific example of alkanolamine, it can be selected from monoethanolamine, diethanolamine, triethanolamine, 2-(2-aminomethoxy)ethanol, 2-(2-ethoxy)ethanol, N-methylethanolamine, N , N-dimethylethanolamine, N-ethylethanolamine, N,N-diethylethanol...
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