Method for manufacturing three-axis thermal convection acceleration sensor chip
A technology of an acceleration sensor and a manufacturing method, which is applied in directions such as multi-dimensional acceleration measurement, acceleration measurement using inertial force, and manufacturing of microstructure devices, which can solve the problems of complex manufacturing process and high cost, and achieve high detection accuracy, good reliability, and realization The effect of cost reduction
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[0023] Below in conjunction with accompanying drawing and specific embodiment the present invention is described in further detail:
[0024] see figure 1 a-1i, the steps to make a three-axis thermal convection acceleration sensor chip are as follows:
[0025] Step 1, forming the first silicon nitride layer 2 supporting layer
[0026] Such as figure 1 As shown in a, after the double-polished substrate single crystal silicon wafer 1 is strictly cleaned, an oxide layer is formed on the surface of the substrate single crystal silicon wafer 1 by high-temperature dry thermal oxidation, and the oxide layer is a high-temperature silicon oxide layer 4 . The substrate single crystal silicon wafer 1 has a thickness of 420 μm and a resistivity of 3˜8 Ω·cm. The thickness of the high temperature silicon oxide layer 4 may be 0.30-0.40 μm, preferably 0.35 μm. The temperature of high temperature dry thermal oxidation can be 900-1100°C, preferably 1000°C.
[0027] Such as figure 1 As sho...
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