Mask alignment surface shape detection device for DUV (deep ultra violet) photolithographic device

A detection device and mask alignment technology, applied in the field of photolithography, can solve the problems of too many light pulses, reducing the service life of the light source, wasting resources, etc.
CN102207683AActive Publication Date: 2011-10-05SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
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Patent Information

Authority / Receiving Office
CN ยท China
Patent Type
Applications(China)
Current Assignee / Owner
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Publication Date
2011-10-05

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Abstract

The invention discloses a mask alignment surface shape detection device for a DUV (deep ultra violet) photolithographic device. The mask alignment surface shape detection device comprises surface shape detection marks, an optical filter, a surface shape silicon photoelectric diode, an amplifier, a signal processing element, an analogue to digital conversion element, an operation processing element and an upper computer, wherein the surface shape detection marks include a plurality of independent detection marks; the optical filter comprises a plurality of optical filter units for converting DUV into visible light; the surface shape silicon photoelectric diode comprises a plurality of independent units; the amplifier comprises a plurality of paths of amplifier units; the signal processing element comprises a plurality of signal processing units; and the analogue to digital conversion unit comprises a plurality of analogue to digital conversion units for performing analogue to digital conversion on analogue signals output by corresponding signal processing units. The surface shape detection device comprises a plurality of detection units, and each detection unit is provided with onecorresponding detection mark, one optical filter unit, one silicon photoelectric diode unit, one amplifier unit, one signal processing unit and one analogue to digital conversion unit.
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Description

technical field

[0001] The invention relates to the field of photolithography, in particular to a mask alignment surface detection device for a DUV photolithography device. Background technique

[0002] The lithography machine belongs to a kind of key equipment on the process line of chip manufacturing. Its principle is to use the projection lens to illuminate the mask plate through the illumination source, and expose the pattern on the mask to the designated position on the silicon wafer. In order to accurately expose the pattern on the mask to the specified position, it is necessary to be equipped with a mask alignment system. The mask alignment system uses detectors on the silicon wafer to detect the imaging of the mask mark on the mask to obtain the imaging position. The positional relationship between the mask and the silicon wafer is achieved through mask alignment and silicon wafer alignment.

[0003] The number of detection units of the existing detection device fo...

Claims

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