Nonvolatile charge capture type storage device, preparation method thereof and application
A storage device, charge capture technology, applied in static memory, read-only memory, semiconductor/solid-state device manufacturing, etc., can solve the problems of energy cost and less research on nanocrystals
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[0034] Embodiment 1: Based on Si substrate, ZrO 2 The preparation process of the nano-microcrystalline-based nonvolatile charge-trapping memory device is as follows:
[0035] (a) Put the Si substrate into an appropriate amount of acetone, ultrasonically clean it, and then ultrasonically clean it with deionized water to rinse off the remaining impurities on the surface of the substrate. Then the substrate is soaked in hydrofluoric acid to remove surface oxides, then ultrasonically cleaned with deionized water, dried with high-purity nitrogen, and then placed in an atomic layer chemical vapor deposition chamber for thin film deposition.
[0036] (b) Al(CH 3 ) 3 As a metal source, ozone is a source of oxygen. Al(CH 3 ) 3 With the nitrogen gas entering the cavity, it reacts with the surface of the hydroxyl-terminated silicon substrate and reaches saturation, and then the oxygen source is brought into the cavity by the nitrogen gas to react with the metal source to form Al 2 ...
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