Substrate for flexible luminescent device and preparation method thereof
A light-emitting device and substrate technology, which is applied in the manufacture of semiconductor/solid-state devices, electric solid-state devices, semiconductor devices, etc., can solve problems such as poor bonding force and large roughness of silver nanowire film, and achieve increased bonding force and high visible light transmittance. The effect of passing rate and improving flatness
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Embodiment 1
[0030] Such as figure 1 In the shown substrate structure, the flexible substrate 1 is made of polyethylene, the conductive layer 2 is made of silver nanowire film, and the gaps of the silver nanowire film are filled with organic light-emitting materials.
[0031] The preparation method is as follows:
[0032] ① Clean the silicon substrate whose surface roughness is less than 1nm, and dry it with dry nitrogen after cleaning;
[0033] ② Disperse the silver nanowires evenly in the solvent, and prepare the silver nanowire film on the clean silicon substrate by spin coating. The rotation speed of the spin coating is 4000 rpm, the duration is 60 seconds, and the film thickness is about 80 nanometers;
[0034] ③ Spray a solution containing organic light-emitting materials on the silver nanowire film, place the silicon substrate in an environment of 80°C for 30 minutes, remove the remaining solvent in the silver nanowire film, and then spray polyethylene on the silver nanowire film; ...
Embodiment 2
[0039] Such as figure 1 In the substrate structure shown, the flexible substrate 1 is made of polymethyl methacrylate, the conductive layer 2 is made of silver nanowire film, and the gaps of the silver nanowire film are filled with organic light-emitting materials.
[0040] The preparation method is as follows:
[0041] ① Clean the silicon substrate whose surface roughness is less than 1nm, and dry it with dry nitrogen after cleaning;
[0042] ② Disperse the silver nanowires evenly in the solvent, and prepare the silver nanowire film on the clean silicon substrate by spraying;
[0043] ③ Spray a solution containing organic light-emitting materials on the silver nanowire film, place the silicon substrate in an environment of 80°C for 30 minutes, remove the remaining solvent in the silver nanowire film, and then spray polymethacrylic acid on the silver nanowire film Methyl ester;
[0044] ④ Thermal curing treatment on the surface of the silicon substrate;
[0045] ⑤Peel the ...
Embodiment 3
[0048] Such as figure 1 In the shown substrate structure, the flexible substrate 1 is made of polycarbonate, the conductive layer 2 is made of silver nanowire film, and the gaps of the silver nanowire film are filled with organic light-emitting materials.
[0049] The preparation method is as follows:
[0050] ① Clean the silicon substrate whose surface roughness is less than 1nm, and dry it with dry nitrogen after cleaning;
[0051] ② Disperse silver nanowires evenly in a solvent, and prepare silver nanowire films on a clean silicon substrate by screen printing;
[0052] ③ Spray a solution containing an organic luminescent material on the silver nanowire film, place the silicon substrate in an environment of 80°C for 30 minutes, remove the remaining solvent in the silver nanowire film, and then spray polycarbonate on the silver nanowire film;
[0053] ④ Thermal curing treatment on the surface of the silicon substrate;
[0054] ⑤Peel the silver nanowire film and the cured p...
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