Preparation method of single crystal silicon texture surface structure

A monocrystalline silicon and suede technology, which is applied in the field of solar energy applications, can solve the problems of restricting production capacity, slow formation speed of suede surface, and limitation of battery efficiency, etc., and achieve the effects of increasing production capacity, saving process time, and fast forming speed
CN102234845AActive Publication Date: 2011-11-09BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Patent Information

Authority / Receiving Office
CN ยท China
Current Assignee / Owner
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
Publication Date
2011-11-09

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Abstract

The invention provides a preparation method of a single crystal silicon texture surface structure, relates to the technical field of solar energy application, and is invented to effectively reduce reflection loss of incident light of a texture surface and to increase forming speed of a texture surface. The preparation method of a single crystal silicon texture surface comprises the following steps: depositing discrete metal particles on a silicon wafer surface; performing corrosion of the silicon wafer deposited with metal particles by a mixed solution of hydrofluoric acid and hydrogen peroxide so as to form a texture surface structure on the silicon wafer surface. The invention is applicable to the preparation process of solar cells.
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Description

technical field

[0001] The invention relates to the technical field of solar energy applications, in particular to a method for preparing a monocrystalline silicon textured structure. Background technique

[0002] The preparation of the textured structure is a common process in the production process of crystalline silicon solar cells. The textured structure can effectively reduce the reflection loss of incident light on the surface of the silicon wafer, increase the utilization rate of light, and then improve the conversion efficiency of the cell. Such as figure 1 As shown, the typical structure of suede currently used is a suede pyramid structure. For a smooth silicon wafer, about 33% of the sunlight incident on the surface is reflected by the surface and cannot be absorbed by the battery. For the suede pyramid structure, due to the pyramid structure on the surface, the incident reflected light will be incident again to reduce the reflection loss.

[0003] In the prior ...

Claims

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