A method of manufacturing a holographic double blazed grating

A technology of blazed gratings and manufacturing methods, applied in the field of diffractive optical elements, can solve the problems of difficult to achieve precise control of width ratio, groove shape and groove depth, no way to achieve precise control, inconsistent etching rate, etc., to achieve Avoid secondary photoresist lithography process, good etching effect, and achieve precise control effect

Active Publication Date: 2016-06-22
SUZHOU UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the grating formed after the photoresist passes through the photolithography process, it is difficult to precisely control its occupation ratio, groove shape and groove depth. The difference in the etching rate will be inconsistent, resulting in the final blazed grating, the blaze angle and the expected error, there is no way to achieve precise control

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  • A method of manufacturing a holographic double blazed grating
  • A method of manufacturing a holographic double blazed grating
  • A method of manufacturing a holographic double blazed grating

Examples

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Embodiment 1

[0062] Example 1: Please refer to image 3 , image 3 It is a schematic diagram of states corresponding to each step in the first embodiment of the present invention. Fabricate a holographic double blazed grating with a grating period of 833 nanometers and two blaze angles of 25° and 10° respectively, using interference exposure, ion beam etching and inclined ion beam scanning etching, including the following steps:

[0063] (1) Coating photoresist 11 on the substrate 10, according to the requirements of the double blazed grating that needs to be made, that is, the grating period (Λ) is 833 nanometers, and the two blazed angles are 25° and 10° respectively. According to the empirical formula of blaze angle θs and groove shape and ion beam incident angle, θs≈α-3°.

[0064] Using a rectangular photoresist grating (see attached figure 2 ) as an example, first make a 25° blaze angle (A blaze angle) grating, generally, the duty ratio f=a / Λ=0.5, by the formula:

[0065] ...

Embodiment 2

[0075] Example 2: Please refer to Figure 4 , Figure 4 It is a schematic diagram of states corresponding to each step in the second embodiment of the present invention. Fabricate a holographic double blazed grating with a grating period of 1000 nanometers and two blaze angles of 25° and 12° respectively, using interference exposure, forward ion beam etching and oblique Ar ion beam scanning etching, including the following steps:

[0076] (1) Coating photoresist 21 on the substrate 20, according to the requirements of the double blazed grating that needs to be made, that is, the grating period (Λ) is 1000 nanometers, and the two blazed angles are 25° and 12° respectively. According to the empirical formula of blaze angle θs and groove shape and ion beam incident angle, θs≈α-3°.

[0077] Using a sinusoidal photoresist grating (see attached Figure 5 ) as an example, at first make a 25 ° blaze angle (A blaze angle) grating, the duty ratio f=a / Λ=0.5 of this grating, the profil...

Embodiment 3

[0090] Example 3: Please refer to Figure 7 , Figure 7 It is a schematic diagram of states corresponding to each step in the third embodiment of the present invention. In this embodiment, the striped plate 37 is used for shielding, so that the two blazed angles A and B of the double blazed grating are distributed alternately, as shown in Figure 7 shown. Fabricate a holographic double blazed grating with a grating period of 500 nanometers and two blaze angles of 20° and 10° respectively, using interference exposure, ion beam etching and inclined ion beam scanning etching, including the following steps:

[0091] (1) Coating photoresist 31 on the substrate 30, according to the requirements of the double blazed grating that needs to be made, that is, the grating period (Λ) is 500 nanometers, and the two blazed angles are 20° and 10° respectively. According to the empirical formula of blaze angle θs and groove shape and ion beam incident angle, θs≈α-3°.

[0092] Taking a rect...

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Abstract

The invention relates to a method for manufacturing a holographic double blazed grating. The two blaze angles of the holographic double blazed grating are A blaze angle and B blaze angle respectively. The homogeneous grating is used as a mask for oblique ion beam etching to achieve different control of the two blaze angles, avoiding the secondary photoresist lithography process. Since the time of forward ion beam etching can be controlled when making the homogeneous grating, the groove depth of the homogeneous grating can be precisely controlled. In addition, since the homogeneous grating mask and the substrate are formed of the same material, the etching time of the two The eclipse rate remains consistent throughout, allowing precise control of the blaze angle.

Description

technical field [0001] The invention relates to a preparation method of a diffractive optical element, in particular to a preparation method of a holographic double blazed grating. Background technique [0002] Grating is a very widely used and important high-resolution dispersive optical element, which occupies a very important position in modern optical instruments. [0003] As we all know, the principal maximum direction of diffraction by a single grating is actually not only the geometrical optics propagation direction of light, but also the zero-order direction of the entire multi-slit grating. It concentrates light energy, but cannot separate various wavelengths. In practical applications, Focus on concentrating as much light energy as possible on a specific order. For this reason, it is necessary to make the diffraction grating into a groove shape determined by calculation, so that the main maximum direction of the diffraction of a single grating groove (or the direc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G03F7/00
CPCG02B5/1857G02B5/203G02B5/32G03F7/0005G03H1/0244G03H1/0476G03H1/182G03H2001/0439G03H2224/04G03H2260/14G03H2260/63G02B5/18G02B5/1842G02B5/1847G02B5/1861G03H1/0402G03H1/181
Inventor 刘全吴建宏陈明辉
Owner SUZHOU UNIV
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