40results about "Holographic writing means" patented technology

The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and / or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimization and allocation control and to optical devices such as those produced thereby.

A method for forming fine concavo-convex patterns by using a relief formation material 3 having a relief formation layer 2 composed of a resin having thermoplasticity and a relief pattern sheet 6 having on a surface thereof fine concavo-convex patterns 5, wherein a photothermal conversion layer 7 is formed in the relief formation material 3 or the relief pattern sheet 6; the photothermal conversion layer 7 is irradiated with light 8 to make the photothermal conversion layer 7 generate heat in the state that the relief formation layer 2 is brought into contact with the fine concavo-convex patterns 5; and the fine concavo-convex patterns 5 are formed on the relief formation layer 2.

A hologram reticle and method of patterning a target. A layout pattern for an image to be transferred to a target is converted into a holographic representation of the image. A hologram reticle is manufactured that includes the holographic representation. The hologram reticle is then used to pattern the target. Three-dimensional patterns may be formed in a photoresist layer of the target in a single patterning step. These three-dimensional patterns may be filled to form three-dimensional structures or else used in a multi-surface imaging composition. The holographic representation of the image may also be transferred to a top photoresist layer of a top surface imaging (TSI) semiconductor device, either directly or using the hologram reticle. The top photoresist layer may then be used to pattern an underlying photoresist layer with the image. The lower photoresist layer is used to pattern a material layer of the device.

The invention relates to a computer-generated hologram fabrication process that can reduce loads on computation of interference fringes for an original image including micro-characters. A visually perceivable original image 11 and a visually unperceivable original image 12 (micro-characters) are defined, and sample point sources of light P are defined at a low density on the original image 11 and at a high density on the original image 12. Interference fringes of object light coming from the point light sources on the original image 11 and reference light R are found on each computation point within an area α1 on a recording surface 20, and interference fringes of object light coming from point light sources on the original image 12 and reference light R are found on each computation point within an area α2 on the recording surface 20. The light sources that become samples are defined at a given pitch on sectional lines obtained by cutting the original images 11 and 12 by a multiplicity of sections (parallel with an XZ plane) located at a given spacing. The section-to-section spacing for the original image 12 is made narrows than that for the original image 11.

A method of producing a security document or article including a substrate (100), which is transparent at least to visible light, and a diffractive optical microstructure (112). The method includes applying an opacifying layer (102) to at least one surface of the transparent substrate (100). An area of the opacifying layer (102) is exposed to laser radiation (108) to ablate apertures (110) in selected portions of the opacifying layer (102), thereby forming a diffractive optical microstructure (112) on the surface of the substrate (100). The laser radiation may be patterned prior to exposing the opacifying layer (102), for example by passing the radiation through a mask (104). Alternatively, a focussed or collimated laser beam (206) may be directed onto the selected portions of the opacifying layer (102). Laser radiation may be directed onto the opacifying layer (102) either directly, or through the transparent substrate (100). Security documents or articles made in accordance with the method are also provided.

A real-time color holographic three-dimensional (3D) display system and method realized by using principles of digital holographic display and a common photographing / projection device array system are provided. For an object O to be displayed, an array of M×N cameras which are anchored to a certain reference point R in a space corresponding to the object O is used to perform spatial spectrum sampling and capturing on any spatial spectrum surface S of the object O with a sampling density being a spatial sampling angle ωmn. Each acquired spatial spectrum view image Imn is projected by a corresponding array of M×N projectors in each spatial spectrum capturing direction to a reference surface PR necessary for restoring 3D information of the original object O. Output of full spatial spectrums of the object O is realized through a spatial spectrum limited stretching function of a holographic functional screen placed on the reference surface PR which is used on discrete spatial spectrum input image information, thereby achieving digital holographic display intended to restore complex wavefronts.

The invention relates to a method for manufacturing a holographic double blazed grating. The two blaze angles of the holographic double blazed grating are A blaze angle and B blaze angle respectively. The homogeneous grating is used as a mask for oblique ion beam etching to achieve different control of the two blaze angles, avoiding the secondary photoresist lithography process. Since the time of forward ion beam etching can be controlled when making the homogeneous grating, the groove depth of the homogeneous grating can be precisely controlled. In addition, since the homogeneous grating mask and the substrate are formed of the same material, the etching time of the two The eclipse rate remains consistent throughout, allowing precise control of the blaze angle.

A structured diamond tool having a predefined grayscale grating profile shape allows a corresponding grayscale grating profile to be machined into a work piece with a single pass with high accuracy. Manufacture of grayscale gratings using this technique saves time compared to the situation where the profile is machined by a single-point diamond tool with multiple passes. Also, more time-saving is realized if more than one period is machined in the diamond tool. Such a tool can be manufactured using a high precision focused ion beam (FIB), which is a true nanomachining tool that can machine features on the order of tens of nanometers. The diamond tool made by FIB therefore has extremely fine resolution and features required by the grayscale grating.

A hologram three-dimensional image information collecting device and method, a reproducting device and method are disclosed. The collecting device comprises M*N two-dimensional image picking-up units Cmn to obtain M*N spatial spectrum sample images of an object O being three-dimensional displayed on an arbitrary spatial spectrum S (2); each sample point Smn corresponds to a body pixel Hmn of the object O; the information obtained by each two-dimensional image picking-up units Cmn corresponds to the spatial spectrum image Imn of the body pixel Hmn; thus, M*N sample spatial spectrum images information of the object O in an array is obtained; M*N two-dimensional image picking-up units Cmn are arranged on the spatial spectrum surface S (2) in a predetermined space sample angle Omegamn with their light axis focus on one reference point R in a corresponding space of the object O; each two-dimensional image picking-up unit Cmn focuses on a visual surface of the object O in the corresponding spatial spectrum direction to obtain a clear spatial spectrum image Imn in the direction; wherein, M, N, m and n are natural numbers and at least one of M and N is larger than 2.

Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.