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Mesh plate for ion neutralization

A stencil, ion technology, applied in discharge tubes, accelerators, electrical components, etc., can solve the problems of low etching rate and poor uniformity of etching process results, and achieve the effect of improving uniformity and efficiency

Inactive Publication Date: 2012-02-01
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to solve the problems of poor uniformity and low etching rate of the existing neutral ion etching process, the present invention provides an ion-neutralizing screen, the ion-neutralizing screen has a stepped structure, and the There are multiple mesh holes on the personalized screen

Method used

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  • Mesh plate for ion neutralization
  • Mesh plate for ion neutralization
  • Mesh plate for ion neutralization

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Embodiment Construction

[0017] The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0018] see figure 2 , the embodiment of the present invention provides an ion-neutralizing screen 23, the ion-neutralizing screen 23 has a stepped structure, and a plurality of mesh holes 22 are arranged on the ion-neutralizing screen. Preferably, the ion-neutralizing screen is a circular ion-neutralizing screen, the diameter of the circular ion-neutralizing screen is 20-5000 mm, and the perforated area 21 of the circular ion-neutralizing screen is circular. The diameter of the circular area is 5-600mm. The thickness of the ion-neutralizing screen is 0.1-500mm, and the diameter of the mesh is 0.1-50mm. The ion-neutralizing screen is made of electrode material, which can be graphite, copper, molybdenum or galvanized aluminum. Inside the electric field, this structure can effectively improve the uniformity of the plasma proc...

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Abstract

The invention discloses a mesh plate for ion neutralization, belonging to the technical field of neutral ion etching. The mesh plate for ion neutralization is in a stepped structure and provided with a plurality of meshes. The mesh plate for ion neutralization, provided by the invention, is beneficial to increasing the ion neutralization efficiency, the uniformity of density distribution of neutral particle beams and the stability of properties of particle speed, and the like and plays a critical role in effectively controlling a neutral particle beam technology.

Description

technical field [0001] The invention relates to the technical field of neutral ion etching, in particular to an ion neutralized screen. Background technique [0002] In the neutral particle beam process system, the ion neutralization screen is a key structure. In the existing solutions, the ions generated in the plasma chamber are neutralized through the meshes on the ion neutralizing screen, and the degree of ion neutralization is greatly affected by the porosity of the ion neutralizing screen. figure 1 It is a schematic structural diagram of a typical ion-neutralizing screen, a circular ion-neutralizing screen 11 is evenly distributed with a plurality of mesh holes 12 . Usually, the porosity of the ion-neutralizing screen is less than 50%, and most ions collide on the surface of the ion-neutralizing screen and cannot enter the mesh, and can be neutralized through the mesh and cause damage to the chip. The particles of etching effect are greatly reduced, which makes the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/32H05H3/00
Inventor 席峰李勇滔李楠张庆钊夏洋
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI