An adhesive film for circuit connection, use thereof, a circuit connection structure, a manufacturing method thereof, and a connection method of a circuit member
A technology for circuit connection and manufacturing method, applied in the field of adhesive films for circuit connection, can solve problems such as stretching of semiconductor elements, and achieve the effects of suppressing deformation, excellent connection reliability, and excellent film formability
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Embodiment 1
[0138]
[0139]Using a coating device (manufactured by Yasui Seiki Co., Ltd., product name: Precision Coater), the coating solution A1 was coated on one side (the surface on which the coating solution was applied) and subjected to a release treatment (middle peeling treatment) on a PET film with a thickness of 50 μm, and dried with hot air at 70° C. for 10 minutes to form a conductive adhesive layer with a thickness of 10 μm on the PET film.
[0140]
[0141] In the same manner as above, using a coating device (manufactured by Yasui Seiki Co., Ltd., product name: Precision Coater), the coating solution B1 was coated on one side of a PET with a thickness of 50 μm that had been subjected to mold release treatment. film, and dried with hot air at 70° C. for 10 minutes to form an insulating adhesive layer with a thickness of 15 μm on the PET film.
[0142]
[0143] The conductive adhesive layer and insulating adhesive layer obtained above were laminated|stacked with the roll...
Embodiment 2~5 and comparative example 1~3
[0145] Except that the types of coating liquids (A1, A2, B1, B2) and the thicknesses (Tc, Ti) of the adhesive layer are shown in Table 3, the same procedure as in Example 1 was carried out to produce an adhesive for circuit connection. membrane.
[0146] table 3
[0147]
[0148] (2) Fabrication of circuit connection structure
[0149]
[0150] As a substrate, a glass substrate (Corning #1737, 38 mm x 28 mm, thickness 0.3 mm) with an ITO (Indium Tin Oxide) circuit pattern (pattern width 50 μm, inter-electrode spacing 5 μm) formed on the surface was prepared. As a semiconductor element, an IC chip (17 mm x 17 mm in outer shape, 0.3 mm in thickness, 50 μm x 50 μm in bump size, 50 μm in interval between bumps, and 15 μm in bump height) was prepared.
[0151]
[0152] Using the adhesive film for circuit connection produced in the said Example and the comparative example, the connection of an IC chip and a glass substrate was performed as follows. In addition, for connect...
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Abstract
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