Preparation method of nano-imprinting composite template
A composite template and nano-imprint technology, applied in the field of micro-nano processing, can solve the problems of slow electron beam direct writing speed and high cost
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[0019] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.
[0020] The preparation of composite template of the present invention mainly comprises and is divided into following steps:
[0021] (1) Preparation and support of polydimethylsiloxane flakes.
[0022] a) After uniformly mixing component A and component B of SYLGARD? 184 polydimethylsiloxane precursor of Dow Corning Corporation in the United States at a mass ratio of 10:1, spin-coat it on the anti-sticking treated silicon wafer at a speed of 300RPM ;
[0023] b) Put a spin-coated polydimethylsiloxane silicon wafer in a vacuum drying oven, evacuate to 0.5 atm, keep the temperature at 65 degrees, and cure after 5 hours of heat preservation;
[0024] c) Divide the cured polydimethylsiloxane sheet into strips using a ruler and a blade;
[0025] d) use as figure 1 The clamp shown holds the polydimethylsiloxane sheet and stretches the sheet as r...
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