Device and method for exchanging of double workpiece tables on lintel type single/double guide rails in double-drive stepping scanning

A technology with double worktables and double guide rails, which is applied in the direction of photolithography exposure devices, microlithography exposure equipment, etc., can solve the problems of large influence on the overall dynamic performance, affecting the dynamic performance of the system, and large reaction force of the abutment, etc., to achieve The single-chip processing cycle is shortened, it is beneficial to control characteristics, and the effect of large driving force

Inactive Publication Date: 2012-03-28
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the patent CN101201555, the conveyor belt and the docking slider are used to complete the stage changing process, the movement rhythm is small, and the operation and maintenance are simple. However, the conveyor belt mechanism and the docking slider are fixed on the abutment, so there will be a large force during the stage changing process On the abutment, it has a great influence on the overall dynamic performance
In the patent CN1485694, the table-changing operation is completed by the docking of the Y-direction linear motor and the linear guide rail. However, due to the excessive gap in the middle of the abutment, a bridging device is introduced, which increases the movement rhythm and increases the time for table-changing. At the same time, the X-direction linear motor magnetically The steel part is fixed on the abutment, and the movement of the moving parts will generate a large reaction force on the abutment when the platform is changed, which in turn affects the dynamic performance of the entire system
In the patent CN101770181, the docking of the replacement unit is used to complete the work of changing the platform, but the guide device is fixed on the abutment. During the movement of changing the platform, the moving parts will generate a large reaction force on the abutment, which in turn affects the dynamic performance of the entire system.
Therefore, the current dual-platform solution needs to be improved.

Method used

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  • Device and method for exchanging of double workpiece tables on lintel type single/double guide rails in double-drive stepping scanning
  • Device and method for exchanging of double workpiece tables on lintel type single/double guide rails in double-drive stepping scanning
  • Device and method for exchanging of double workpiece tables on lintel type single/double guide rails in double-drive stepping scanning

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Experimental program
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Effect test

Embodiment approach 1

[0025] A lintel-type single / double guide rail dual-drive step-scanning double-workpiece stage exchange device, which includes a first wafer stage 11 running on the pre-processing station 6 and a first wafer stage 11 running on the exposure stage set on the same base 1 The second wafer stage 12 of the station 7 is provided with four first, second, third, and fourth linear motion units 21, 22, 23, and 24 in the Y direction on the four edges of the base 1, respectively, One first and second linear motion units 31 and 32 in the X direction are arranged on the symmetrical sides of the base 1, and two lower bottom surfaces along the X direction are arranged in the middle of the base 1 than the first and second. The lintel type first and second linear motion units 41, 42 on the working surfaces of two silicon wafer stages 11, 12; 1. The second, third, and fourth linear motion units 21, 22, 23, 24 and the first and second linear motion units 31, 32 in the X direction perform X-Y motio...

Embodiment approach 2

[0031] Such as Figure 10 As shown, the structure of the two lintel-type first and second linear motion units 41 and 42 placed in the middle of the abutment in Embodiment 1 is modified to obtain Embodiment 2. In Embodiment 1, the first and second linear motion units 41, 42 of the lintel type are composed of linear motors and air bearing guide rails, while in Embodiment 2, the new first and second linear motion units 41, 42 of the lintel type are not Contains linear motor structure, but only air bearing guide. Compared with Embodiment 1, in Embodiment 2, the drive in the X direction is changed from double drive to single drive, because the silicon wafer stage at the exposure station still adopts double guide rails and double drive in the Y direction, so the angular rigidity is large and the resistance is high. The advantages such as torque still exist; at the same time, because the single drive is used in the Y direction, the inconsistency of the driving force at both ends of ...

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Abstract

A device and a method for exchanging of double workpiece tables on lintel type single / double guide rails in double-drive stepping scanning belong to semiconductor manufacturing equipment. The system comprises a silicon wafer table running at an exposure station and a silicon wafer table running at a pretreatment station, and the two silicon wafer tables are arranged on a same base table. Four linear movement units in the Y direction and two linear movement units in the X direction are arranged at the edge of the base table; two lintel type linear movement units higher than the working surface of the silicon wafer table in the X direction are arranged in the middle of the base table; and the linear movement in the X direction of the linear movement units in the Y direction can be realized by the linear movement units in the X direction, and the linear movement units in the Y direction and movement sliders of the movement units in the Y direction can realize the movement of the silicon wafer table in the X direction or in the Y direction. The device and the method can improve the torque interference resisting capacity of the guide rail and reduces or overcomes movement deviation and deformation deviation due to the interference of torque, thereby enhancing the movement precision of the silicon wafer table. The table exchanging process only needs three beats, so that the time for exchanging the double tables is shortened, and the production efficiency of a lithography machine is enhanced obviously.

Description

technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a lintel-type single / double guide rail double-drive step-scanning double-workpiece exchange device and method. Background technique [0002] Photolithography technology is to transfer the pattern on the mask plate to the photoresist coated on the surface of the silicon wafer by exposure method, and transfer the pattern on the photoresist to the silicon wafer by subsequent development, etching and other technologies. Lithography machine is one of the important ultra-precision system engineering equipment in lithography technology, and its overall performance plays a very important role in the whole lithography process. The main function of the workpiece table is to carry the wafer under the condition of high speed and high acceleration to achieve nanoscale positioning, complete the processes of loading and unloading, pre-alignment, and alignment ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 谭久彬王绍凯崔继文
Owner HARBIN INST OF TECH
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