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Method for preparing dual-dimension SiO2 photonic crystals

A photonic crystal, double-size technology, applied in the direction of silicon dioxide, silicon oxide, etc., can solve the problems that affect the research and application of metamaterials, complex equipment technology, single optical performance, etc., to broaden the types of photonic crystal structures and their applications, The effect of stable process control and simple production process

Active Publication Date: 2013-12-18
NANTONG XINCI MACHINERY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The optical performance of a single-size photonic crystal is relatively single. For example, a single-size photonic crystal shows a defect with a narrow band gap, which seriously affects the research and application of metamaterials.
At present, the preparation of double-sized photonic crystals mainly adopts the microfabrication method or the combination of microfabrication method and self-assembly method. The microfabrication method adopted is precise and controllable, has good repeatability, and can controllably introduce defects during the preparation process. However, the equipment of the microfabrication method is complicated, the cycle is long, and the cost is high. In addition, the photoresist, developer, etching solution, cleaning solution, etc. used in the preparation process are not conducive to environmental protection.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] A dual-size SiO 2 The preparation method of photonic crystal comprises the following steps:

[0019] In the first step, tetraethyl orthosilicate with a volume ratio of 1:1 and ammonia water with a mass concentration of 25% are respectively dissolved in an equal volume of absolute ethanol to form solution A and solution B, wherein in solution A, tetraethyl orthosilicate The concentration of the ester is 0.15 mol / L. Add solution B to solution A under continuous magnetic stirring. After continuous stirring for 22 hours, centrifuge, wash with water and alcohol, and dry at 50°C to obtain SiO 2 Nano or submicron spheres;

[0020] In the second step, the prepared particle size ratio is large balls: small balls = 8:1 two kinds of SiO 2 Spherical particles were weighed according to the mass ratio of large ball: small ball = 5: 1, and the two kinds of SiO 2 Spherical particles were ultrasonically dispersed in ethanol for 2 hours, and two kinds of SiO 2 The mass fraction of th...

Embodiment 2

[0023] A dual-size SiO 2 The preparation method of photonic crystal comprises the following steps:

[0024] In the first step, tetraethyl orthosilicate with a volume ratio of 1:1 and ammonia water with a mass concentration of 28% are respectively dissolved in an equal volume of absolute ethanol to form solution A and solution B, wherein in solution A, tetraethyl orthosilicate The concentration of the ester is 0.5 mol / L. Add solution B to solution A under continuous magnetic stirring. After continuous stirring for 22 hours, centrifuge, wash with water and alcohol, and dry at 60°C to obtain SiO 2 Nano or submicron spheres;

[0025] In the second step, two kinds of SiO with the prepared particle size ratio of large spheres: small spheres = 3:1 2 Spherical particles were weighed according to the mass ratio of large ball: small ball = 10:1, and the two kinds of SiO 2 Spherical particles are ultrasonically dispersed in water, the ultrasonic time is 2h, and two kinds of SiO 2 The...

Embodiment 3

[0028] A dual-size SiO 2 The preparation method of photonic crystal comprises the following steps:

[0029] In the first step, tetraethyl orthosilicate with a volume ratio of 1:5 and ammonia water with a mass concentration of 28% are respectively dissolved in an equal volume of absolute ethanol to form solution A and solution B, wherein in solution A, tetraethyl orthosilicate The concentration of the ester is 0.5 mol / L. Add solution B to solution A under continuous magnetic stirring. After continuous stirring for 22 hours, centrifuge, wash with water and alcohol, and dry at 55°C to obtain SiO 2 Nano or submicron spheres;

[0030] In the second step, two kinds of SiO with the prepared particle size ratio of large spheres: small spheres = 6:1 2 Spherical particles were weighed according to the mass ratio of large ball: small ball = 30:1, and the two kinds of SiO 2 Spherical particles were ultrasonically dispersed in methanol for 3 hours, and two kinds of SiO 2 The mass fract...

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Abstract

The invention relates to a method for preparing dual-dimension SiO2 photonic crystals, which comprises the following steps that: firstly, tetraethoxysilane is used as raw materials for preparing SiO2 nanometer and submicron spherical particles, ultrasonic measures are adopted for obtaining SiO2 suspension solution, and dual-dimension SiO2 photonic crystal structures are obtained through vertical deposition. The method has the advantages that the preparation period is short, the process equipment is simple, and the cost is low.

Description

technical field [0001] The invention relates to a preparation method of a photonic crystal, in particular to a double-sized SiO 2 Preparation methods of photonic crystals. Background technique [0002] The concept of photonic crystals refers to the periodic and ordered arrangement of dielectric materials with different dielectric constants or refractive indices in one-dimensional, two-dimensional or three-dimensional directions, so as to selectively inhibit or suppress the propagation of light of specific wavelengths. Modulating material. The optical performance of a single-size photonic crystal is relatively single. For example, a single-size photonic crystal exhibits a narrow band gap defect, which seriously affects the research and application of metamaterials. At present, the preparation of double-sized photonic crystals mainly adopts the microfabrication method or the combination of microfabrication method and self-assembly method. The microfabrication method adopted ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/23C04B41/50C01B33/12
Inventor 伍媛婷王秀峰
Owner NANTONG XINCI MACHINERY