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Micro-nano structure scanning probe processing method from edge of graphene

A technology of scanning probes and micro-nano structures, which is applied in the field of micro-nano processing, can solve problems such as difficult direct processing of nano-structures, numerous processing steps, and difficult processing paths, etc., and achieves strong flexibility, excellent mechanical and electrical properties, and balance Economical effect

Active Publication Date: 2020-04-24
SOUTHWEST JIAOTONG UNIV
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

The top-down processing method has many steps, it is difficult to directly process a specific nanostructure, and the processing parameters are not easy to control; H-plasma etching generally expands the processing area into a regular hexagon, and it is difficult to set flexible processing according to specific needs path; the bottom-up processing method inevitably introduces chemical impurities, which will directly affect the electrical properties of the processed structure
Therefore, the current technical reserves in this field cannot fully meet the extreme processing requirements for future flexible devices with high reliability, high stability and low cost.

Method used

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  • Micro-nano structure scanning probe processing method from edge of graphene
  • Micro-nano structure scanning probe processing method from edge of graphene
  • Micro-nano structure scanning probe processing method from edge of graphene

Examples

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Effect test

example 1

[0026] Adopt the method of the present invention to process the nano channel, the process is as follows:

[0027] A1. Install the tapered silicon probe with strong surface chemical activity on the scanning probe processing equipment, then place the prepared graphene sample on the processing table, scan to obtain the graphene surface morphology, and search for the graphene edge.

[0028] A2. Position the scanning probe to the graphene edge area, set its trajectory, and control the probe to scratch from the graphene edge to the inside under the action of low contact pressure (such as normal load 1μN), and observe the friction The change of the force curve monitors the processing status in real time; the specific scanning probe equipment will feed back the friction curve of the interaction between the probe and graphene during the processing process, and the processing status can be judged in real time through the friction curve, as well as the set processing status. Whether the ...

example 2

[0032] The micro-nano letter structure processed on the surface of graphene by scanning probe and graphene edge tribochemical processing method, the processing process is as follows:

[0033] B1, the sample preparation steps are the same as in Example 1, first look for the graphene atomic step edge;

[0034] B2. Position the scanning probe to the edge of the graphene step, set the load for processing letters and the trajectory of the probe, and control the probe to carve and process the micro-nano letter structure along the trajectory;

[0035] B3. After the processing is completed, the micro-nano letter structure morphology of the processing area is obtained by in-situ scanning.

[0036] image 3 In order to use the method of this example to process the letter combination "NF", which is the abbreviation of "Nano-Fabrication".

[0037] The probe material with strong surface chemical activity in the present invention is one of silicon, silicon dioxide, ceria, and silicon nitr...

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Abstract

The invention discloses a micro-nano structure scanning probe processing method from the edge of graphene, is applied to the field of graphene micro-nano processing, and aims to solve the problem thatexisting technology cannot fully meet the requirements of high reliability, high stability and low cost of future flexible devices. According to the method, a probe with strong surface chemical activity is used as a processing tool, scribing processing is carried out from the edge of the graphene to the inside according to a set processing track, and carbon atoms in a contact area are removed under low contact pressure lower than the mechanical breaking strength of the graphene by utilizing a frictional chemical reaction between the probe and the carbon atoms at the edge of the graphene in the scribing processing process; and the mechanical and electrical properties of the micro-nano structure processed by adopting the method are consistent with those of a graphene matrix.

Description

technical field [0001] The invention belongs to the field of micro-nano processing, in particular to a graphene micro-nano processing technology. Background technique [0002] Nanotechnology has created a new era of human life in the 21st century, and technology based on integrated circuits has prompted human beings to enter the information age of rapid development. However, with the development over the years, the development of silicon-based integrated circuit technology has approached the physical limit of its characteristic line width, and it is urgent to find alternative materials for silicon and develop new flexible nano-devices. Two-dimensional materials represented by graphene show great potential for manufacturing future electronic devices with their excellent mechanical and electrical properties. Therefore, exploring new two-dimensional material processing technologies and increasing relevant technical reserves is a national strategy to keep up with international d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01Q70/16B81C1/00B82Y40/00
CPCB81C1/00547B82Y40/00G01Q70/16
Inventor 陈磊陈超钱林茂石鹏飞郭杰唐川
Owner SOUTHWEST JIAOTONG UNIV
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