Medium gas assisted vapor-transport deposition device for solar cell thin film deposition
A thin film deposition and solar cell technology, which is applied in the field of medium gas-assisted vapor transport deposition devices, can solve the problems of only going up or down, material loss, and poor uniformity of evaporation source injection, so as to achieve stable gas source properties Effect
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Embodiment 1
[0022] See Figure 4 , a medium gas-assisted vapor transport deposition device, comprising: a heating beam distributor 1, a heating beam source generator 2, a heating beam transmission pipeline 3 vacuum-connected to the heating beam distributor and the heating beam source generator.
[0023] The heating beam distributor 1 is tubular, and consists of a beam guide tube 101 , a heater 102 , an insulating layer 103 , an insulating layer 104 , and a cooling water jacket 105 , which are sequentially nested from inside to outside. The insulating layer 103 and the thermal insulation layer 104 can be one layer, two layers or three layers.
[0024] The beam guide tube 101 has a row of holes 1011 parallel to the axis of the tube on its tube wall. The holes are circular or oval or square or conical in shape. The two sides are sparse in turn, and the pores are narrowed, and the specific size can be determined according to the requirements of the deposited film. In this embodiment, round ...
Embodiment 2
[0030] The difference between embodiment 2 and embodiment 1 is that the beam source can be sprayed up and down simultaneously, and the film production speed can be doubled, see Figure 8 .
[0031] The structural difference is that there are two beam guide tubes 101 in the heating beam distributor 1 .
[0032] The heating beam transmission pipeline 3 is divided into two channels from one channel, which are respectively connected with two beam guide tubes through flanges.
[0033] In the deposition chamber 7 , a row of holes corresponding to the two beam guide tubes are provided with movable supports 8 for placing the deposited film substrate 4 .
[0034] The device of the invention can transport and deposit cadmium telluride, cadmium sulfide, cadmium chloride, selenium and selenide, etc.; the medium gas adopts inert gas such as helium, nitrogen and argon.
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