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Medium gas assisted vapor-transport deposition device for solar cell thin film deposition

A thin film deposition and solar cell technology, which is applied in the field of medium gas-assisted vapor transport deposition devices, can solve the problems of only going up or down, material loss, and poor uniformity of evaporation source injection, so as to achieve stable gas source properties Effect

Inactive Publication Date: 2013-08-21
上海太阳能电池研究与发展中心
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, from the perspective of existing technologies, the powder is heated inside the deposition chamber, and then becomes gaseous, and is transported to the surface of the glass substrate by air flow; the coating direction can only be upward or downward; the spraying uniformity of the evaporation source is insufficient. It is good, and the US patent is not a real line source, but uses a slit on the ceramic tube wall, the middle of the slit is large, and the two ends are small to achieve uniform control of the beam; the source evaporates upward, relying on the reflection of the reflector The effect is to spray the beam source downward, and the spray angle is very large, which is easy to cause material loss; CN201442975U adopts a multi-layer reflector to realize the uniformity of the beam

Method used

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  • Medium gas assisted vapor-transport deposition device for solar cell thin film deposition
  • Medium gas assisted vapor-transport deposition device for solar cell thin film deposition
  • Medium gas assisted vapor-transport deposition device for solar cell thin film deposition

Examples

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Embodiment 1

[0022] See Figure 4 , a medium gas-assisted vapor transport deposition device, comprising: a heating beam distributor 1, a heating beam source generator 2, a heating beam transmission pipeline 3 vacuum-connected to the heating beam distributor and the heating beam source generator.

[0023] The heating beam distributor 1 is tubular, and consists of a beam guide tube 101 , a heater 102 , an insulating layer 103 , an insulating layer 104 , and a cooling water jacket 105 , which are sequentially nested from inside to outside. The insulating layer 103 and the thermal insulation layer 104 can be one layer, two layers or three layers.

[0024] The beam guide tube 101 has a row of holes 1011 parallel to the axis of the tube on its tube wall. The holes are circular or oval or square or conical in shape. The two sides are sparse in turn, and the pores are narrowed, and the specific size can be determined according to the requirements of the deposited film. In this embodiment, round ...

Embodiment 2

[0030] The difference between embodiment 2 and embodiment 1 is that the beam source can be sprayed up and down simultaneously, and the film production speed can be doubled, see Figure 8 .

[0031] The structural difference is that there are two beam guide tubes 101 in the heating beam distributor 1 .

[0032] The heating beam transmission pipeline 3 is divided into two channels from one channel, which are respectively connected with two beam guide tubes through flanges.

[0033] In the deposition chamber 7 , a row of holes corresponding to the two beam guide tubes are provided with movable supports 8 for placing the deposited film substrate 4 .

[0034] The device of the invention can transport and deposit cadmium telluride, cadmium sulfide, cadmium chloride, selenium and selenide, etc.; the medium gas adopts inert gas such as helium, nitrogen and argon.

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Abstract

The invention discloses a medium gas assisted vapor-transport deposition device for solar cell thin film deposition. The device comprises a heating beam flow distributor, a heating beam source generator and a heating beam flow transmission pipeline which is in vacuum connection with the heating beam flow distributor and the heating beam source generator. The device has the following advantages: the beam flow distributor, beam source generator and beam flow transmission pipeline all adopt the heating mode so that the properties of the gas source can be stable for long time; the condition that gaseous Cd, Te2 and CdTe are deposited on the pipe wall to block the pipeline can be avoided; by adjusting the opening of a beam flow guide pipe, the uniformity of the properties of the film in the line source direction can be realized; and with the help of the medium gas, the beam flow distributor can eject beam flow downwards or / and upwards.

Description

technical field [0001] The invention relates to thin-film solar cell manufacturing process equipment, in particular to a medium gas-assisted gas-phase transport deposition device for thin-film deposition of solar cells. Background technique [0002] Cadmium telluride thin-film battery has become one of the potential application thin-film batteries because of its relatively simple preparation process, high production efficiency, and high component efficiency. As the core pn junction, there are many kinds of preparation techniques. The preparation processes used for p-CdTe include: vacuum evaporation, near space sublimation, gas phase transport, physical vapor deposition, magnetron sputtering, electronic chemical deposition, metal organic vapor deposition, thermal spraying and screen printing deposition, etc. The first three methods are the current mainstream methods, as the key direction of experimental research and industrialization considerations, these three methods have ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/24
Inventor 褚君浩赵守仁王善力张传军曹鸿邬云华孙朋超刘婷婷
Owner 上海太阳能电池研究与发展中心