Production process of ultra-high-purity isopropanol

Abstract

The invention discloses a production process of ultra-high-purity isopropanol, which comprises the following process steps of: (1) delivering a feed stream containing at least 98% of industrial grade isopropanol into a molecular sieve adsorption tower from the bottom of the molecular sieve adsorption tower, dehydrating through a molecular sieve, and then flowing out of the top of the tower to obtain high-purity isopropanol of which the moisture content is less than 100ppm; (2) filtering the high-purity isopropanol taken out of the molecular sieve adsorption tower by using a filter so as to remove particles of which the sizes are more than 1mum; and (3) transferring the high-purity isopropanol which is qualified by filtering into a distillation tower and a rectification column for rectifying, then transferring the rectified high-purity isopropanol into a condenser to be condensed into high-purity liquid isopropanol, enabling the condensed high-purity liquid isopropanol after rectifying to pass through a deionized resin tank, and deionizing through ionic resin so as to obtain ultra-high-purity isopropanol of which the metallic impurity is less than 0.1ppb. The production process disclosed by the invention is carried out under the normal pressure, and has the advantages of mild reaction conditions, simple operation processes and good safety performance.

Description

technical field [0001] The invention relates to the technical field of electronic chemicals, in particular to a production process of ultra-high-purity isopropanol. Background technique [0002] Semiconductor manufacturing operations require wafer surfaces to be as clean as possible. Sometimes, this is difficult to do, especially when wafers or chips are cleaned with an aqueous solution and then dried. The drying process often creates stains, leaving undesirable residues on the surface. This can be a hindrance that causes defects in the manufacturing process. [0003] Ultra-high-purity isopropanol due to its ability to clean after water. Isopropanol can be vaporized rapidly without leaving good performance of residues. It is used in the production process of large-scale and ultra-large-scale integrated circuits (ICs), mainly in the cleaning process. Its purity and cleanliness have a great impact on the finished products of integrated circuits. Efficiency, electrical perf...

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