Plasma density measuring equipment of high temperature resistant embedded double-probe type
A plasma and density measurement technology, applied in the direction of measuring devices, measuring electrical variables, measuring current/voltage, etc., can solve the problems of difficult to determine the effective collection area, poor resistance to high temperature and oxidation, and affect the aerodynamic shape of the aircraft, so as to improve the quality of the plasma Volume shape measurement, good insulation at high temperature, small size effect
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[0020] Below in conjunction with accompanying drawing and specific embodiment the present invention is described in further detail:
[0021] Such as figure 1 Shown is the structural schematic diagram of the plasma density measuring device of the present invention, it can be known from the figure that the measuring device comprises a boron nitride insulating base 1, two iridium electrode probes 2,5, two probe electrode guard rings 3,4 and two The electrodes are connected with wires 6,7. Among them, the insulating base 1 is made of boron nitride, and its insulation resistance is as high as 10 14 Ω-cm, in addition, it has high thermal conductivity and processability.
[0022] Two iridium electrode probes 2, 5 are embedded in the boron nitride insulating base 1, the first probe electrode guard ring 3 surrounds the first iridium electrode probe 2, and the second probe electrode guard ring 4 surrounds the second iridium electrode probe Around the electrode probe 5, and the distan...
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