Plasma density measuring equipment of high temperature resistant embedded double-probe type
A plasma and density measurement technology, applied in the direction of measuring devices, measuring electrical variables, measuring current/voltage, etc., to achieve the effect of improving plasma shape measurement, improving measurement accuracy, and high measurement accuracy
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[0022] Below in conjunction with accompanying drawing and specific embodiment the present invention is described in further detail:
[0023] Such as figure 1 Shown is the structural schematic diagram of the plasma density measuring device of the present invention, it can be known from the figure that the measuring device comprises a boron nitride insulating base 1, two iridium electrode probes 2,5, two probe electrode guard rings 3,4 and two The electrodes are connected with wires 6,7. Among them, the insulating base 1 is made of boron nitride, and its insulation resistance is as high as 10 14 Ω-cm, in addition, it has high thermal conductivity and processability.
[0024] Two iridium electrode probes 2, 5 are embedded in the boron nitride insulating base 1, the first probe electrode guard ring 3 surrounds the first iridium electrode probe 2, and the second probe electrode guard ring 4 surrounds the second iridium electrode probe Around the electrode probe 5, and the dista...
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