Method for measuring impurities in 4-5N high-purity tin by plasma atomic emission spectrometer
An atomic emission and plasma technology, which is used in thermal excitation analysis, material excitation analysis, etc., to achieve the effect of fast measurement speed, reduced workload, and high detection authenticity.
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[0069] Detection of impurities in a sponge of high-purity tin:
[0070] The specific determination method steps are as follows:
[0071] 1. Clean the sample
[0072] Weigh about 10g of high-purity tin, process it into granules, place it in a quartz beaker, soak it with (1+1) hydrochloric acid (excellent grade) and boil it at 60°C, use it after cooling, and remove it with 18.2 megohm level Rinse several times with deionized water, dry in a plexiglass glove box, and set aside.
[0073] 2. Sample dissolution
[0074] Weigh one unit of sample into a 200ml quartz beaker, add aqua regia, heat at low temperature to dissolve, after complete dissolution, add 5ml hydrochloric acid when heated to dryness, continue to dissolve, repeat this process twice, and finally add 5ml hydrochloric acid to transfer to 100ml capacity In the bottle, dilute to the mark with deionized water to obtain the sample solution, the concentration value is C;
[0075] 3. Instrument operation
[0076] After p...
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