The invention provides a method for measuring impurities in 4-5N high-purity
tin by a
plasma atomic
emission spectrometer, comprising the following steps of: weighing one unit of a sample, dissolving by adding
aqua regia into a
beaker, completely dissolving, replenishing
hydrochloric acid, continuously heating at low temperature, repeating twice, finally replenishing
hydrochloric acid, putting into a 100mL
volumetric flask, and setting the volume at degree scale by deionized water for later measurement; remaining a pre-prepared standard work curve with the concentration from low to high for later use; and turning on the
plasma atomic
emission spectrometer, turning on a water
circulating pump, turning on analysis
control software, entering a '
standard curve method' control program, selecting a spectrum line for detecting in a spectrum line
bank, setting a curve concentration value, carrying out full-
wave band scanning, sequentially sucking sample solution of the standard work curve into the
spectrometer according to a sequence that the concentration is from low to high, clicking a test key to obtain an
initial curve point of the point after suction at each time, confirming the curve, so as to enable the
linear coefficient of the curve to be more than 0.99, sucking solution to be measured into the
spectrometer, outputting concentration value results of each element to be measured, and obtaining percentage content results of each element to be measured according to a calculation formula.