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Manufacture method of high resolution super diffraction focusing structure lens

A focusing structure, high-resolution technology, applied in the field of super-diffraction-limited focusing of metal nanohole arrays, can solve problems such as limited diffraction

Active Publication Date: 2012-08-01
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Abstract
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  • Application Information

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Problems solved by technology

Due to the traditional zone plate and microscopy technology focusing in air, the focus spot is usually diffraction limited

Method used

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  • Manufacture method of high resolution super diffraction focusing structure lens
  • Manufacture method of high resolution super diffraction focusing structure lens
  • Manufacture method of high resolution super diffraction focusing structure lens

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Embodiment Construction

[0034] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments, but the scope of protection of the present invention is not limited to the following examples, but should include all content in the claims.

[0035] The concrete steps of the embodiment of the present invention are as follows:

[0036] (1) Select the working wavelength λ as 442nm, and the polarization mode is circular polarization, and determine that the focal length of the designed resolution-enhanced superdiffraction focusing structure lens is f=0.8um;

[0037] (2) Select silicon dioxide as the base material, and deposit 50nm metal chromium on its surface;

[0038] (3) Allow the incident light to be incident perpendicular to the upper surface of the metal chromium film, and use the formula (1) to calculate the skin depth of the light at the working wavelength to be 10nm;

[0039] d F = ...

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Abstract

The invention provides a manufacture method of a high resolution super diffraction focusing structure lens, which includes selecting a proper substrate material, evaporating or sputtering and precipitating a metal film on a substrate, enabling monochromatic light in certain polarization state to enter in incident mode and be perpendicular to the metal film, selecting a central point on the upper surface of the metal film as the coordinate origin, enabling a coordinate axis passing through the central point to be the X axis and the Y axis and a connection line perpendicular to the metal film to be the Z axis, calculating Fresnel each-level annular belt position of the metal film according to the aplanatism principle, utilizing the prior nanometer processing art, opening nanometer small holes on each annular belt area of the metal film, determining periodic or non-periodic arrangement position of the nanometer small holes in the annular belt area through the polarization state of the incidence light, and then alternatively evaporating or sputtering and precipitating the nanometer and medium plane multi-layer film structure with nanometer thickness. The manufacture method is simple in lens structure, capable of being used in nanometer photoetching and data storage, greatly improves integration level of electronic devices and has wide development prospect.

Description

technical field [0001] The invention relates to the technical field of super-diffraction-limited focusing of metal nanohole arrays, and in particular to a method for manufacturing a high-resolution super-diffraction focusing structure lens, which can produce a metal film with holes in the band regions of various levels and A resolution-enhanced lens combined with alternately deposited metal and dielectric multilayer film structures. Background technique [0002] In recent years, with the development of nanofabrication technology, more and more researchers have carried out the research of nanophotonics. Nanophotonics has important application prospects in the fields of single-molecule detection, plasmonic laser, super-resolution focusing and imaging, and nanolithography. Because traditional zone plates and microscopy techniques focus in air, the focused spot is usually diffraction-limited. Although the traditional phase contrast technology and oil immersion technology can i...

Claims

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Application Information

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IPC IPC(8): G02B5/18
Inventor 罗先刚赵泽宇王长涛冯沁王彦钦胡承刚黄成陶兴杨磊磊姚纳
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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