Method for cleaning sapphire substrate
A sapphire substrate, sapphire technology, applied in cleaning methods and appliances, chemical instruments and methods, etc., can solve the problems of poor yield, inability to remove oxide layer and subsurface damage layer, unstable GaN epitaxial process, etc. Product yield improvement effect
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[0016] Example
[0017] A method for cleaning a sapphire substrate is to clean the sapphire substrate by removing organic impurities and inorganic metal impurities, and then cleaning by hydrogen nitrogen plasma, including the following steps:
[0018] (1) Place the sapphire substrate in electronically pure isopropanol and clean it with megasonic waves with a frequency of 1MHz for 10 minutes;
[0019] (2) Use electronic grade pure water to wash the sapphire substrate sheet cleaned in step (1) by spraying and overflowing for 15 minutes;
[0020] (3) Use NH 3 ·H 2 O: H 2 O 2 : H 2 The sapphire substrate cleaned in step (2) is cleaned for 10 minutes with a mixture of O=1:1:5, and the cleaning temperature is 80°C;
[0021] (4) Use electronic grade pure water to wash the sapphire substrate sheet cleaned in step (3) by spraying and overflowing for 15 minutes;
[0022] (5) Use HCl: H 2 O 2 : H 2 The sapphire substrate cleaned in step (4) is cleaned for 10 minutes with a mixture of O=1:1:5, and t...
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